Nozzles and Systems for Cleaning Vehicle Sensors

ABSTRACT

Nozzles and systems for cleaning sensors of a vehicle are provided. An adjustable nozzle can include an inlet configured to receive a pressurized fluid, an adjustable oscillator coupled with the inlet, and an outlet coupled with the adjustable oscillator. The adjustable oscillator can be configured to receive the pressurized fluid from the inlet and generate an oscillating fluid, and can include a first oscillation wall comprising a first adjustable chamber modifier wall and a second oscillation wall comprising a second adjustable chamber modifier wall. The first adjustable chamber modifier wall and the second adjustable chamber modifier wall can define an adjustable mixing chamber configured to generate the oscillating fluid having one or more properties that are adjustable by the first adjustable chamber modifier wall or the second adjustable chamber modifier wall. The outlet can be configured to receive the oscillating fluid and eject the oscillating fluid from the adjustable nozzle.

PRIORITY CLAIM

The present application is continuation of U.S. application Ser. No.15/839,100 having a filing date of Dec. 12, 2017. The presentapplication is further based on and claims benefit of U.S. ProvisionalApplication 62/583,143 having a filing date of Nov. 8, 2017. Applicantclaims priority to and benefit of all such applications and incorporatesall such applications herein by reference.

FIELD

The present disclosure relates generally to nozzles for cleaning sensorsof a vehicle using a pressurized fluid.

BACKGROUND

An autonomous vehicle is a vehicle that is capable of sensing itsenvironment and navigating with minimal or no human input. Inparticular, an autonomous vehicle can observe its surroundingenvironment using a variety of sensors and can attempt to comprehend theenvironment by performing various processing techniques on sensor datacollected by the sensors. Given knowledge of its surroundingenvironment, the autonomous vehicle can identify an appropriate motionpath through such surrounding environment.

Thus, a key objective associated with an autonomous vehicle is theability to perceive the location of objects that are proximate to theautonomous vehicle and/or determine other information about theautonomous vehicle and its relationship to the surrounding environment.One aspect such an objective is the collection of sensor data by thevariety of sensors included in or otherwise coupled to the vehicle.

However, autonomous vehicle sensors can suffer from the presence ofprecipitation, debris, contaminants, or environmental objects whichinterfere with the ability of the sensor to collect the sensor data. Asone example, rain, snow, frost, or other weather-related conditions candegrade the quality of the sensor data collected by a given sensor whenpresent. For example, raindrops, snow, or other condensation can collecton the lens or other components of a sensor (e.g., a camera or a LightDetection and Ranging (LIDAR) sensor), thereby degrading the quality ofthe sensor data collected by the sensor. As another example, dirt, dust,road salt, organic matter (e.g., “bug splatter,” pollen, bird droppings,etc.), or other contaminants can accumulate on or adhere to a givensensor (e.g., on the sensor cover, housing, or other external componentof the sensor), thereby degrading the quality of the sensor datacollected by the sensor.

SUMMARY

Aspects and advantages of embodiments of the present disclosure will beset forth in part in the following description, or can be learned fromthe description, or can be learned through practice of the embodiments.

One example aspect of the present disclosure is directed to a nozzle fora cleaning system. The nozzle can include an inlet configured to receivea high pressure fluid. The nozzle can further include an oscillatorcoupled with the inlet. The oscillator can be configured to receive thehigh pressure fluid from the inlet and generate an oscillating fluid.The nozzle can further include an outlet coupled with the oscillator.The outlet can be configured to receive the oscillating fluid andprovide the oscillating fluid to a surface to delaminate debris from thesurface. The inlet can provide an unimpeded path of fluid flow to theoscillator.

Another example aspect of the present disclosure is directed to acleaning system for a sensor. The sensor can include a surface. Thecleaning system can include a source of high pressure fluid. The highpressure fluid can be a fluid at a pressure greater than 4.8 bar. Thecleaning system can further include a nozzle. The nozzle can include aninlet configured to receive a high pressure fluid from the source ofhigh pressure fluid. The nozzle can further include an oscillatorcoupled with the inlet. The oscillator can be configured to receive thehigh pressure fluid from the inlet and generate an oscillating fluid.The nozzle can further include an outlet coupled with the oscillator.The outlet can be configured to receive the oscillating fluid andprovide the oscillating fluid to the surface to delaminate debris fromthe surface.

Another example aspect of the present disclosure is directed to anautonomous vehicle. The autonomous vehicle can include a sensorcomprising a surface and a cleaning system. The cleaning system caninclude a source of high pressure fluid. The high pressure fluid can bea fluid at a pressure greater than 4.8 bar. The cleaning system canfurther include a flow control device coupled with the source of highpressure fluid. The cleaning system can further include a controllerconfigured to control operation of the flow control device. The cleaningsystem can further include a nozzle. The nozzle can include an inletconfigured to receive a high pressure fluid from the source of highpressure fluid. The nozzle can further include an oscillator coupledwith the inlet. The oscillator can be configured to receive the highpressure fluid from the inlet and generate an oscillating fluid. Thenozzle can further include an outlet coupled with the oscillator. Theoutlet can be configured to receive the oscillating fluid and providethe oscillating fluid to the surface to delaminate debris from thesurface. The flow control device can be configured to allow or impede aflow of the high pressure fluid from the source of high pressure fluidto the nozzle.

Another example aspect of the present disclosure is directed to anadjustable nozzle. The adjustable nozzle can include an inlet configuredto receive a pressurized fluid. The adjustable nozzle can furtherinclude an adjustable oscillator coupled with the inlet. The adjustableoscillator can be configured to receive the pressurized fluid from theinlet and generate an oscillating fluid. The adjustable oscillator caninclude a first oscillation wall comprising a first adjustable chambermodifier wall. The adjustable oscillator can further include a secondoscillation wall comprising a second adjustable chamber modifier wall.The first adjustable chamber modifier wall and the second adjustablechamber modifier wall can define an adjustable mixing chamber configuredto generate the oscillating fluid having one or more properties that areadjustable by the first adjustable chamber modifier wall or the secondadjustable chamber modifier wall. The adjustable nozzle can furtherinclude an outlet coupled with the adjustable oscillator. The outlet canbe configured to receive the oscillating fluid and eject the oscillatingfluid from the adjustable nozzle.

Another example aspect of the present disclosure is directed to acleaning system. The cleaning system can include a source of pressurizedfluid and an adjustable nozzle. The adjustable nozzle can include aninlet configured to receive a pressurized fluid. The adjustable nozzlecan further include an adjustable oscillator coupled with the inlet. Theadjustable oscillator can be configured to receive the pressurized fluidfrom the inlet and generate an oscillating fluid. The adjustableoscillator can include a first oscillation wall comprising a firstadjustable chamber modifier wall. The adjustable oscillator can furtherinclude a second oscillation wall comprising a second adjustable chambermodifier wall. The first adjustable chamber modifier wall and the secondadjustable chamber modifier wall can define an adjustable mixing chamberconfigured to generate the oscillating fluid having one or moreproperties that are adjustable by the first adjustable chamber modifierwall or the second adjustable chamber modifier wall. The adjustablenozzle can further include an outlet coupled with the adjustableoscillator. The outlet can be configured to receive the oscillatingfluid and eject the oscillating fluid from the adjustable nozzle.

Another example aspect of the present disclosure is directed to anautonomous vehicle. The autonomous vehicle can include a sensorcomprising a surface and a cleaning system. The cleaning system caninclude a source of high pressure fluid, a controller, and an adjustablenozzle. The adjustable nozzle can include an inlet configured to receivea pressurized fluid. The adjustable nozzle can further include anadjustable oscillator coupled with the inlet. The adjustable oscillatorcan be configured to receive the pressurized fluid from the inlet andgenerate an oscillating fluid. The adjustable oscillator can include afirst oscillation wall comprising a first adjustable chamber modifierwall. The adjustable oscillator can further include a second oscillationwall comprising a second adjustable chamber modifier wall. The firstadjustable chamber modifier wall and the second adjustable chambermodifier wall can define an adjustable mixing chamber configured togenerate the oscillating fluid having one or more properties that areadjustable by the first adjustable chamber modifier wall or the secondadjustable chamber modifier wall. The adjustable nozzle can furtherinclude an outlet coupled with the adjustable oscillator. The outlet canbe configured to receive the oscillating fluid and eject the oscillatingfluid from the adjustable nozzle. The one or more properties can includeat least one of an oscillation frequency, an oscillation angle, or adirection of a flow of the oscillating fluid. The controller can beconfigured to control the adjustable nozzle to eject the oscillatingfluid onto the surface to delaminate debris from the surface.

Other aspects of the present disclosure are directed to various systems,apparatuses, non-transitory computer-readable media, user interfaces,and electronic devices.

These and other features, aspects, and advantages of various embodimentsof the present disclosure will become better understood with referenceto the following description and appended claims. The accompanyingdrawings, which are incorporated in and constitute a part of thisspecification, illustrate example embodiments of the present disclosureand, together with the description, serve to explain the relatedprinciples.

BRIEF DESCRIPTION OF THE DRAWINGS

Detailed discussion of embodiments directed to one of ordinary skill inthe art is set forth in the specification, which makes reference to theappended figures, in which:

FIG. 1 depicts a block diagram of an example autonomous vehicleaccording to example embodiments of the present disclosure;

FIG. 2 depicts a block diagram of an example cleaning system accordingto example aspects of the present disclosure;

FIG. 3 depicts a top-view of an example nozzle according to exampleaspects of the present disclosure;

FIG. 4 depicts a side-view of an example nozzle according to exampleaspects of the present disclosure;

FIG. 5 depicts a top-view of an example nozzle according to exampleaspects of the present disclosure;

FIG. 6 depicts an example nozzle providing an oscillating sprayaccording to example aspects of the present disclosure;

FIG. 7 depicts an example nozzle configured to clean the surface of asensor according to example aspects of the present disclosure;

FIG. 8 depicts an example nozzle at an angle of inclination to a surfaceaccording to example aspects of the present disclosure;

FIG. 9 depicts a perspective view of an example adjustable nozzleaccording to example aspects of the present disclosure; and

FIG. 10 depicts a perspective view of an example adjustable nozzleaccording to example aspects of the present disclosure.

DETAILED DESCRIPTION

Example aspects of the present disclosure are directed to nozzles andsystems for cleaning sensors of an autonomous vehicle. For example, thenozzles of the present disclosure can include an inlet configured toreceive a pressurized fluid (e.g., a high pressure fluid). Thepressurized fluid can be, for example, a liquid fluid at a pressuregreater than 4.8 bar. The nozzle can further include an oscillatorcoupled with the inlet. The oscillator can be configured to receive thepressurized fluid from the inlet and generate an oscillating fluid. Forexample, the oscillating fluid can oscillate at a particular frequency,such as, for example, 100 Hz. The nozzle can further include an outletcoupled with the oscillator. The outlet can be configured to receive theoscillating fluid and provide the oscillating fluid to a surface todelaminate debris from the surface. For example, the surface can be asurface of a sensor of an autonomous vehicle, and the nozzle can bepositioned to allow for the oscillating fluid to delaminate debris fromthe surface of the sensor. The inlet can provide an unimpeded path offluid to the oscillator. For example, the inlet can be free fromobstructions, such as posts configured to widen the oscillating fluidgenerated by the oscillator.

In some implementations, the nozzle can be included in a cleaningsystem. For example, a cleaning system can include a source of highpressure fluid. For example, in some implementations, the source of highpressure fluid can include a pressurized tank. In some implementations,the fluid can be provided to the pressurized tank from a fluidreservoir, and the pressurized tank can be pressurized by a gas, such asair from a compressor. In some implementations, the fluid can bepressurized at a pressure greater than 4.8 bar. In some implementations,the cleaning system can include a flow control device (e.g., a valve,solenoid, etc.) in fluid communication with the source of high pressurefluid and the nozzle. For example, the flow control device can becoupled between the source of high pressure fluid and the nozzle. Theflow control device can be configured to allow or impede a flow of highpressure fluid from the source of high pressure fluid (e.g., apressurized tank) to the nozzle. For example, in some implementations,the flow control device can be a valve or a solenoid. In someimplementations, the cleaning system can further include a controllerconfigured to control operation of the flow control device. For example,the controller can be configured to open or close the flow controldevice to allow the high pressure fluid to flow from the source of highpressure fluid (e.g., a pressurized tank) to the nozzle. The nozzle canreceive the high pressure fluid, and provide an oscillating fluid to asurface, such as a surface of a sensor, in order to delaminate debrisfrom the sensor.

According to additional aspects of the present disclosure, in someimplementations, the nozzle can be an adjustable nozzle. The adjustablenozzle can include an inlet configured to receive a pressurized fluid,and an adjustable oscillator configured to receive the pressurized fluidfrom the inlet and generate an oscillating fluid. The adjustableoscillator can include a first oscillation wall and a second oscillationwall, which can include a first adjustable chamber modifier wall andsecond adjustable chamber modifier wall, respectively. The firstadjustable chamber modifier wall and the second adjustable chambermodifier wall can define an adjustable mixing chamber configured togenerate the oscillating fluid have one or more properties that areadjustable by the first adjustable chamber modifier wall and the secondadjustable chamber modifier wall. For example, in some implementations,the first adjustable chamber modifier wall and the second adjustablechamber modifier wall can be adjusted so as to adjust an oscillationfrequency, an oscillation angle, and/or a direction of a flow of theoscillating fluid. In this way, the nozzles and systems of the presentdisclosure can allow for a high pressure fluid to be used to generate anoscillating fluid to delaminate debris from a sensor of an autonomousvehicle.

More particularly, an autonomous vehicle can be a ground-basedautonomous vehicle (e.g., car, truck, bus, etc.), an air-basedautonomous vehicle (e.g., airplane, drone, helicopter, or otheraircraft), or other types of vehicles (e.g., watercraft). In someimplementations, the autonomous vehicle can include a vehicle computingsystem that assists in controlling the autonomous vehicle. Inparticular, in some implementations, the vehicle computing system canreceive sensor data from one or more sensors that are coupled to orotherwise included within the autonomous vehicle. As examples, the oneor more sensors can include one or more LIDAR sensors, one or more RADARsensors, one or more cameras (e.g., visible spectrum cameras, infraredcameras, etc.), and/or other sensors. The sensor data can includeinformation that describes the location of objects within thesurrounding environment of the autonomous vehicle.

In some implementations, the sensors can be located at various differentlocations on the autonomous vehicle. As an example, in someimplementations, one or more cameras and/or LIDAR sensors can be locatedin a pod or other structure that is mounted on a roof of the autonomousvehicle while one or more RADAR sensors can be located in or behind thefront and/or rear bumper(s) or body panel(s) of the autonomous vehicle.As another example, camera(s) can be located at the front or rearbumper(s) of the vehicle as well. Other locations can be used as well.

The autonomous vehicle can include a cleaning system that cleans the oneor more sensors of an autonomous vehicle, such as a fluid cleaningsystem (e.g., a gas or a liquid). For example, the sensor cleaningsystem can include a gas cleaning system that cleans the sensors using agas (e.g., compressed air); a liquid cleaning system that cleans thesensors using a liquid (e.g., windshield washer fluid); or both a gascleaning system and a liquid cleaning system.

In particular, in some implementations, the cleaning system can includeone or more nozzles that are configured to respectively clean one ormore sensors of the autonomous vehicle. In some implementations, eachsensor can include a nozzle configured to provide a fluid to the sensorto delaminate debris from the sensor (e.g., from a surface of thesensor). In some implementations, the nozzles can be configured toprovide a liquid fluid to the sensor. For example, in someimplementations, the liquid fluid can be windshield washer fluid,methanol, propylene glycol, antifreeze, and/or ethanol.

The cleaning system can include one or more fluid source(s) that supplyone or more fluid(s). As an example, in some implementations, the fluidsource(s) can include a tank that stores a pressurized volume of a gas.For example, the tank can store pressurized air received from acompressor. As another example, for a liquid cleaning system, the fluidsource(s) can include a liquid reservoir that stores a liquid (e.g., awindshield washer liquid reservoir). The fluid cleaning system caninclude a pump that pumps the liquid from the liquid reservoir to thenozzle(s). As yet another example, for a liquid cleaning system, thefluid source can include a tank that stores a pressurized volume of theliquid. For example, in some implementations, the volume of liquid canbe pressurized using a pressurized gas (e.g., compressed air). In someimplementations, the fluid can be a high pressure fluid, such as a fluidat a pressure of greater than 4.8 bar (approximately 70 psi).

The cleaning system can be configured to delaminate debris from theautonomous vehicle sensors. For example, in some implementations, eachsensor of an autonomous vehicle can have one or more nozzles configuredto clean the sensor. In some implementations, the cleaning system caninclude a plurality of nozzles, each nozzle configured to clean asensor. The cleaning system can further include a flow control device(e.g. a solenoid) configured to allow or impede the flow of fluid fromthe fluid source to a nozzle. In some implementations in which aplurality of nozzles are included in the cleaning system, the cleaningsystem can include a plurality of flow control devices (e.g.,solenoids), that respectively control a flow of the fluid from the fluidsource to each respective nozzle. In some implementations, a pluralityof flow control devices can be included in a manifold (e.g., a solenoidmanifold) or other combined structure. In some implementations, one ormore of the flow control device manifolds (e.g., solenoid manifolds) canbe integrated with the corresponding fluid tank.

In some implementations, the cleaning system can include one or morecontrollers which can individually control each flow control device toallow the flow of the fluid to the corresponding nozzle to enable thecorresponding nozzle to generate an oscillating fluid to delaminatedebris from the corresponding sensor. For example, one or morecontrollers can be configured to actuate a solenoid to allow the highpressure fluid to be provided to a nozzle.

The cleaning system can further include one or more nozzles. Each nozzlecan include an inlet configured to receive a high pressure fluid. Forexample, in some implementations, the inlet can include a first inletwall and a second inlet wall opposite the first inlet wall. The firstinlet wall can have a first portion and a second portion, and the secondinlet wall can have a first portion and a second portion. The firstportion of the first inlet wall and the first portion of the secondinlet wall can define an opening configured to receive the high pressurefluid. For example, the opening can be configured to attach to a supplyline, such as via a compression coupling, threaded coupling, solderedconnection, brazed connection, mechanical fastener, or other suitableconnection type. In some implementations, the second portion of thefirst inlet wall and the second portion of the second inlet wall candefine a first throat having a first width. For example, in someimplementations, the inlet can narrow from the opening to the firstthroat. In such a configuration, the narrowing of the inlet can aid inaccelerating the flow of the fluid flowing through the inlet. The inletcan provide an unimpeded path of fluid flow. For example, the inlet canbe free from posts or other obstructions configured to widen theoscillation angle of oscillating fluid generated by the nozzle.

The nozzle can further include an oscillator coupled with the inlet. Forexample, fluid can flow through the inlet into the oscillator. Theoscillator can be configured to receive the fluid (e.g., a high-pressurefluid) from the inlet and generate an oscillating fluid. The oscillatorcan be associated with a longitudinal direction, a tangential directionthat is perpendicular to the longitudinal direction, an upstreamdirection that is parallel to the longitudinal direction, and adownstream direction that is opposite to the upstream direction. Forexample, the longitudinal direction can generally follow the directionof the flow of the high pressure fluid through the nozzle, wherein theupstream direction is along the longitudinal direction relative to wherethe fluid is received, and the downstream direction is along thelongitudinal direction relative to where the oscillating fluid isprovided from the oscillator. The tangential direction can be, forexample, generally perpendicular to the longitudinal direction.

In some implementations, the oscillator can include a first side walland a second side wall opposite the first side wall. The oscillator canfurther include a first oscillation wall and a second oscillation wall.The first oscillation wall and the first side wall can define a firstbypass tube. Similarly, the second oscillation wall and the second sidewall can define a second bypass tube. The first oscillation wall and thesecond oscillation wall can define a mixing chamber with a second throathaving a second width along the tangential direction at an upstreamposition of the mixing chamber, and a third throat with a third widthalong the tangential direction at a downstream position of the mixingchamber. In some implementations, the first oscillation wall and thesecond oscillation wall can both be generally concave in nature, suchthat the mixing chamber has a maximum width along the tangentialdirection between the second and third throat that is greater than thewidth of the second throat and the width of the third throat. Forexample, the mixing chamber can generally widen from the second throatto the maximum width, and generally narrow from the maximum width to thethird throat. Stated differently, the width of the second throat can beless than the maximum width, and the width of the third throat can beless than the maximum width.

In some implementations, the first bypass tube of the oscillator can beconfigured to receive a first portion of the fluid received from theinlet, and the second bypass tube can be configured to receive a secondportion of the fluid received from the inlet. The mixing chamber can beconfigured to receive third portion of the fluid received from theinlet. For example, the fluid can be a high pressure fluid, which canflow through the opening of the inlet, through the first throat, andinto the oscillator, the first bypass tube, and the second bypass tube.The first portion of the fluid can flow through the first bypass tube,the second portion of the fluid can flow through the second bypass tube,and the third portion can flow through the second throat into the mixingchamber. The mixing chamber can be configured to combine at least aportion of the first portion, at least a portion of the second portion,and at least a portion of the third portion of the fluid to generate theoscillating fluid. For example, a portion of the first portion and aportion of the second portion of the fluid can flow from the firstbypass tube and second bypass tube, respectively, through the thirdthroat into the mixing chamber to combine with at least a portion of thethird portion. The interaction of the first portion, the second portion,and the third portion of the fluid in the mixing chamber can generatethe oscillating fluid by creating pressure and/or flow differentialswithin the mixing chamber. For example, alternating pressuredifferentials can be generated along the first oscillation wall and thesecond oscillation wall to cause the flow of the oscillating fluid tosweep from side to side.

The nozzle can further include an outlet coupled with the oscillator.The outlet can be configured to receive the oscillating fluid andprovide the oscillating fluid to a surface to delaminate debris from thesurface. For example, the surface can be a surface of a sensor (e.g.LIDAR sensor, radar sensor, camera, etc.).

In some implementations, the outlet can include a first exit wallproximate to the first bypass tube and a second exit wall proximate tothe second bypass tube. The first and second exit walls can define afourth throat having a fourth width, and an exit. In someimplementations, the outlet can narrow from the fourth throat to theexit. For example, the first bypass tube can be configured such that thefirst bypass tube generally wraps around the first oscillation wall, andthe second bypass tube can be configured such that the second bypasstube generally wraps around the second oscillation wall. Each bypasstube can include an opening defined by the first and second throats, anda terminal end defined by the fourth throat and the first and secondoscillation walls, respectively. The first exit wall can be proximate tothe first bypass tube, and the second exit wall can be proximate to thesecond bypass tube.

In some implementations, the outlet can widen at a downstream locationfrom the exit. For example, in some implementations, the exit caninclude angled exit side walls which extend from the exit to the end ofthe nozzle. In some implementations, the angled exit side walls can beat an angle of approximately 60°. The angled exit side walls can be atother angles as well.

In some implementations, each oscillation wall can include a bumper at adownstream portion of the oscillation wall. In some implementations,each bumper can include a generally convex portion configured to assistin directing a flow from each respective bypass tube into the mixingchamber.

Each bumper can define a bumper length generally along the longitudinaldirection. For example, the bumper length can be the length of thebumper from the third throat to the terminal end of the respectivebypass tube. In some implementations, the ratio of the first throat tothe bumper length of each oscillation wall can be approximately 1.0. Asused herein, the term approximately when used in reference to a ratiomeans within plus or minus 20% of the stated value. For example, thebumper length can be a specific width, and the width of the first throatcan be approximately the same width as the bumper length.

In some implementations, the ratio of the width of the opening to thewidth of the first throat can be approximately 2.8. For example, theopening of the inlet can be approximately 2.8 times wider than the widthof the first throat. In some implementations, the ratio of the width ofthe opening width to the width of the first throat can be within a rangeof 2.24 to 3.36.

In some implementations, the ratio of the width of the second throat tothe width of the first throat can be approximately 1.25. For example,the second throat in the oscillator can be approximately 1.25 timeswider than the width of the first throat. Thus, the second throat can bewider than the first throat, which can allow the flow of fluid to expandas it enters the second throat from the first throat. In someimplementations, the ratio of the width of the second throat to thewidth of the first throat can be within a range of 1.0 to 1.5.

In some implementations, the ratio of the width of the third throat tothe width of the first throat can be approximately 2.4. For example, thethird throat can be approximately 2.4 times wider than the width of thefirst throat. In some implementations, the ratio of the width of thethird throat to the width of the first throat can be within a range of1.92 to 2.88.

In some implementations, the ratio of the width of the maximum width ofthe mixing chamber to the first throat can be approximately 3.5. Forexample, the maximum width of the mixing chamber can be approximately3.5 times wider than the width of the first throat. In someimplementations, the ratio of the width of the maximum width to thewidth of the first throat can be within a range of 2.8 to 4.2.

In some implementations, the ratio of the width of the fourth throat tothe width of the first throat can be approximately 2.0. For example, thefourth throat in the oscillator can be approximately 2.0 times widerthan the width of the first throat. In some implementations, the ratioof the width of the fourth throat to the width of the first throat canbe within a range of 1.6 to 2.2.

In some implementations, the exit of the outlet can be narrower than thefirst throat. For example, the ratio of the width of the exit to thewidth of the first throat can be approximately 0.8. In someimplementations, the ratio of the width of the exit to the width of thefirst throat can be within a range of 0.64 to 0.96.

Each bypass tube can define a bypass width. The bypass width can be, forexample, the width of the bypass tube between the respective side walland the respective oscillation wall. In some implementations, the ratioof the bypass width to the width of the first throat can beapproximately 0.6. For example, the bypass width of each bypass tube canbe narrower than the first throat. In some implementations, the ratio ofthe bypass width of each bypass tube to the width of the first throatcan be within a range of 0.48 to 0.72.

In some implementations, the high-pressure fluid received at the inletcan be a fluid at a pressure of greater than 4.8 bar (approximately 69psi). In some implementations, the high-pressure fluid can be at apressure within a range of 4.8 bar to 6.2 bar. In some implementations,the high pressure fluid can be at any suitable pressure.

In some implementations, the oscillating fluid can oscillate atapproximately 100 Hz. As used herein, the term “approximately” when usedin reference to an oscillation frequency means within plus or minus 20%of the stated value. For example, the oscillator of a nozzle can beconfigured to receive a fluid, such as a high-pressure fluid, andgenerate an oscillating fluid which sweeps from side to side. In someimplementations, the oscillator can be configured to generate anoscillating fluid that oscillates at approximately 100 Hz. In someimplementations, the oscillator can be configured to generate anoscillating fluid that oscillates at a frequency within a range of 80 Hzto 120 Hz.

In some implementations, the oscillating fluid can oscillate across andoscillation angle of approximately 30°. As used herein, the term“oscillation angle” refers to an angle across which the oscillatingfluid oscillates. As used herein, the term “approximately” when used inreference to an angle means within plus or minus 5° of the stated value.For example, the longitudinal direction of the nozzle can correspond toa centerline of fluid flow. The oscillating fluid can oscillate fromapproximately 15° on one side of the centerline to 15° on the oppositeside of the centerline, thus having an oscillation angle ofapproximately 30°. In some implementations, the oscillating fluid canoscillate across an oscillation angle within a range of 25° to 35°. Theflow of the oscillating fluid can sweep from one side of the centerlineto the other side of the centerline, thus oscillating between the twosides.

In some implementations, the nozzle can be positioned at an angle ofinclination in a range of approximately 14° to 16° to the surface. Forexample, the surface can be a surface of a sensor, and the nozzle can bepositioned such that the nozzle is at approximately a 14° to 16° angleto the surface. In some implementations, the nozzle can be positioned atan angle of inclination within a range of 9° to 21° to the surface. Bypositioning the nozzle at an angle of inclination, the oscillating fluidfrom the nozzle can be directed onto the surface in a manner thatgenerates a wave of oscillating fluid that sweeps from side to sideacross the oscillation angle. This wave of oscillating fluid can aid indelaminating debris from the surface.

According to additional aspects the present disclosure, in someimplementations, the cleaning system can include an adjustable nozzle.For example, in some implementations, the mixing chamber of the nozzlecan be adjustable by adjusting a least a portion of the firstoscillation wall or a portion of the second oscillation wall.

For example, an adjustable nozzle can include an inlet configured toreceive a pressurized fluid. In some implementations, the pressurizedfluid can be a high-pressure fluid, such as a fluid at a pressure ofgreater than 4.8 bar. The inlet can be configured to receive thepressurized fluid by, for example, coupling the inlet to a supply lineconnected to a fluid source. The fluid source can be, for example, apressurized tank or other fluid source as described herein.

The adjustable nozzle can further include an adjustable oscillatorcoupled with the inlet. The adjustable oscillator can be configured toreceive the pressurized fluid from the inlet and generate an oscillatingfluid. The oscillator can include a first oscillation wall comprising afirst adjustable chamber modifier wall and a second oscillation wallcomprising a second adjustable chamber modifier wall. The firstadjustable chamber modifier wall and the second adjustable chambermodifier wall can define an adjustable mixing chamber configured togenerate the oscillating fluid having one or more properties that areadjustable by the first adjustable chamber modifier wall or the secondadjustable chamber modifier wall. For example, in some implementations,the first adjustable chamber modifier wall and the second adjustable,modifier wall can be used to adjust an oscillation frequency, anoscillation angle, and/or a direction of a flow of the oscillatingfluid. The adjustable nozzle can further include an outlet coupled withthe adjustable oscillator, which can be configured to receive theoscillating fluid and eject the oscillating fluid from the adjustablenozzle.

The adjustable oscillator can further include a first side wall and asecond side wall. The first side wall can be generally opposite thesecond side wall. The first oscillation wall can include a first bypasswall. The first bypass wall and the first side wall can define a firstbypass tube. Similarly, the second oscillation wall can include a secondbypass wall. The second bypass wall and the second side wall can definea second bypass tube.

In some implementations, the first bypass tube of the adjustableoscillator can be configured to receive a first portion of the fluidreceived from the inlet, and the second bypass tube can be configured toreceive a second portion of the fluid received from the inlet. Theadjustable mixing chamber can be configured to receive third portion ofthe fluid received from the inlet. For example, the fluid can bepressurized fluid, which can flow through the opening of the inlet andinto the oscillator. The first portion of the fluid can flow through thefirst bypass tube, the second portion of the fluid can flow through thesecond bypass tube, and the third portion can flow through the secondthroat into the adjustable mixing chamber. The adjustable mixing chambercan be configured to combine at least a portion of the first portion, atleast a portion of the second portion, and at least a portion of thethird portion of the fluid to generate the oscillating fluid. Forexample, a portion of the first portion and a portion of the secondportion of the fluid can flow from the first bypass tube and secondbypass tube, respectively, back into the adjustable mixing chamber tocombine with at least a portion of the third portion. The interaction ofthe first portion, the second portion, and the third portion of thefluid in the adjustable mixing chamber can generate the oscillatingfluid by creating pressure and/or flow differentials within theadjustable mixing chamber. For example, alternating pressuredifferentials can be generated along the first adjustable chambermodifier wall and the second adjustable chamber modifier wall to causethe flow of the oscillating fluid to sweep from side to side.

The adjustable oscillator can define a longitudinal direction, atangential direction, an upstream direction, and a downstream direction.For example, the longitudinal direction can generally follow thedirection of the flow of the pressurized fluid through the nozzle,wherein the upstream direction is along the longitudinal directionproximate to where the pressurized fluid is received, and the downstreamdirection is along the longitudinal direction proximate to where theoscillating fluid is provided from the nozzle. The tangential directioncan be, for example, generally perpendicular to the longitudinaldirection.

In some implementations, the first oscillation wall can include a firstupstream flexure at an upstream portion of the first oscillation walland a first downstream flexure at a downstream portion of the firstoscillation wall. The first adjustable chamber modifier wall can beconnected to the first bypass wall via the first upstream flexure andthe first downstream flexure. For example, the first bypass wall of thefirst oscillation wall can be connected to a floor of the adjustableoscillator. For example, the adjustable nozzle can be cast or machinedout of a single piece of material, and the first bypass wall can beaffixed to the floor of the adjustable oscillator. The first adjustablechamber modifier wall can be connected to the first bypass wall by thefirst upstream flexure in the first downstream flexure. The firstupstream flexure and the first downstream flexure can be independentlymovable by, for example, being flexible in order to allow the firstadjustable chamber modifier wall to move generally along the tangentialdirection to increase or decrease the adjustable mixing chamber. Forexample, while the first bypass wall can be affixed to the floor of theadjustable oscillator, the first adjustable chamber modifier wall andthe first upstream and first downstream flexures can be disconnectedfrom the floor. In this way, the first upstream and first downstreamflexures can extend and retract generally along the tangential directionto expand or contract the adjustable mixing chamber.

Similarly, the second oscillation wall can include a second upstreamflexure at an upstream portion of the second oscillation wall and asecond downstream flexure at a downstream portion of the secondoscillation wall. The second adjustable chamber modifier wall can beconnected to the second bypass wall via the second upstream flexure andthe second downstream flexure. The second upstream flexure and thesecond downstream flexure can be independently movable by, for example,being flexible in order to allow the first adjustable chamber modifierwall to move generally along the tangential direction to increase ordecrease the adjustable mixing chamber, as with the first adjustablechamber modifier wall.

In some implementations, the independent movement of the first upstreamflexure, the first downstream flexure, the second upstream flexure, andthe second downstream flexure can be controlled by a controller toadjust the adjustable mixing chamber. For example, in someimplementations, the adjustable nozzle can include one or moreelectromagnets configured to generate one or more electromagneticfields. The controller can be configured to control the one or moreelectromagnets to adjust the shape of the adjustable mixing chamber. Forexample, the adjustable nozzle can further include one or moremagnetically controllable fluids, such as FerroFluid, which can react tothe one or more electromagnetic fields to adjust the shape of theadjustable mixing chamber.

For example, in some implementations, the first bypass wall and thefirst chamber modifier wall can define a first upstream cavity at anupstream portion of the first oscillation wall and a first downstreamcavity at a downstream portion of the first oscillation wall. Similarly,the second bypass wall and the second chamber modifier wall can define asecond upstream cavity at an upstream portion of the second oscillationwall and a second downstream cavity at a downstream portion of thesecond oscillation wall.

In some implementations, the first oscillation wall can include a firstupstream magnetically controllable fluid positioned in the firstupstream cavity and a first downstream magnetically controllable fluidpositioned in the first downstream cavity. For example, the magneticallycontrollable fluid can be FerroFluid. The magnetically controllablefluid can be controlled by a magnetic field. For example, a magneticfield can cause the magnetically controllable fluid to align along themagnetic field flux lines. Similarly, the second oscillation wall caninclude a second upstream magnetically controllable fluid positioned inthe second upstream cavity and a second downstream magneticallycontrollable fluid positioned in the second downstream cavity. As themagnetically controllable fluids align with the respectiveelectromagnetic fields, the magnetically controllable fluids can exert apressure on the respective flexures and/or adjustable chamber modifierwalls to expand or contract the adjustable mixing chamber.

For example, in some implementations, the adjustable nozzle can includea first upstream electromagnet configured to generate a first upstreamelectromagnetic field across the first upstream magneticallycontrollable fluid, a first downstream electromagnet configured togenerate a first downstream electromagnetic field across the firstdownstream magnetically controllable fluid, a second upstreamelectromagnet configured to generate a second upstream electromagneticfield across the second upstream magnetically controllable fluid, and asecond downstream electromagnet configured to generate a seconddownstream electromagnetic field across the second downstreammagnetically controllable fluid. For example, each of the electromagnetscan be positioned outside of the bypass tubes generally along thetangential direction from the respective magnetically controllablefluids.

In some implementations, each of the electromagnets can be controlled togenerate a respective magnetic field. For example, a current can be runthrough each electromagnet to generate a respective magnetic field. Themagnetically controllable fluid (e.g., FerroFluid) can react to therespective magnetic field by forming along the flux lines of the field.This, in turn, can cause the respective magnetically controllable fluidto expand the flexures in the respective location. For example, thefirst upstream magnetically controllable fluid can extend or contractgenerally along the tangential direction, thereby creating a force onthe first upstream flexure, causing the upstream portion of the firstchamber modifier wall to extend or retract generally along thetangential direction, thereby narrowing or expanding the adjustablemixing chamber. Similarly, each respective magnetically controllablefluid can react to a respective magnetic field generated by therespective electromagnet.

In some implementations, the first adjustable chamber modifier wall andthe second adjustable chamber modifier wall can define an upstreamthroat along the tangential direction at an upstream portion of theadjustable mixing chamber and a downstream throat along the tangentialdirection at a downstream portion of the adjustable mixing chamber. Thefirst upstream electromagnet and the second upstream electromagnet canbe configured to adjust a width and orientation of the upstream throatby generating the first upstream electromagnetic field and the secondupstream electromagnetic field, respectively. Similarly, the firstdownstream electromagnetic and the second downstream electromagnet canbe configured to adjust a width and orientation of the downstream throatby generating the first downstream electromagnetic field and the seconddownstream electromagnetic field, respectively. In this way, theadjustable mixing chamber can be finely controlled by controlling theelectromagnetic fields generated by each of the electromagnets in theadjustable nozzle.

In some implementations, the first upstream electromagnet, the firstdownstream electromagnet, the second upstream electromagnet, and thesecond downstream electromagnet can be configured to be controlled by acontroller to induce the first upstream electromagnetic field, thesecond downstream electromagnetic field, the second upstream lookedmagnetic field, and the second downstream electromagnetic field,respectively. For example, the controller can be configured to control acurrent provided to each of the electromagnets independently. In thisway, the controller can be configured to control the movement of theadjustable chamber walls by controlling the current provided to theelectromagnets.

In some implementations, the pressurized fluid can be a fluid at apressure greater than 4.8 bar. In some implementations, the pressurizedfluid can be a liquid fluid, such as windshield washer fluid, methanol,propylene glycol, antifreeze, and/or ethanol.

In some implementations, the adjustable nozzle can be configured toeject the oscillating fluid onto a surface of a sensor of an autonomousvehicle to delaminate debris from the surface. For example, theadjustable nozzle can be positioned at an angle to a surface of a sensorsuch as, at an inclination angle of approximately 12-14°.

In some implementations, the nozzles (e.g., static or adjustable nozzle)according to example aspects the present disclosure can include abaseplate and a top. The baseplate can be, for example, a single pieceof material which can include the inlet, the oscillator (e.g., static oradjustable oscillator), and the outlet. The top can be, for example, asingle piece of material configured to attach to the baseplate in orderto enclose the inlet, the oscillator, and the outlet.

In some implementations, the base plate and top can be manufactured frommetal, plastic, or any other suitable material. For example, in someimplementations, the baseplate can be milled from a solid piece ofmaterial (e.g., aluminum, steel, plastic). For example, the inlet,bypass flow tubes, mixing chamber, and outlet can be cut into a solidpiece of material, thereby creating a floor and the various fluid flowpathways of the nozzle. In some implementations, the baseplate can bemanufactured by additive manufacturing, injection molding, or any othersuitable process. In some implementations, the top can be manufacturedout of a corresponding piece of material, such as metal or plastic, andcan be attached to the baseplate in order to enclose the variouschambers. For example, in some implementations, the top be attached tothe baseplate via laser welding, ultrasonic welding, brazing,conventional welding, coupling via one or more fasteners (e.g., screws),or any other suitable method. In some implementations, the top can beessentially parallel to the floor of the baseplate.

The nozzles and cleaning systems according to example aspects of thepresent disclosure can provide any number of technical effects andbenefits. For example, one advantage provided by the nozzles accordingto example aspects of the present disclosure as compared to conventionalnozzles is that the nozzles provided herein can allow for a relativelystraight flow path of fluid through the nozzles. For example, in someconventional nozzles, one or more posts may be included in an inletregion of the nozzle, which can cause a wider oscillation angle of theoscillating fluid ejected from the nozzle. Such posts, however, canimpede the flow of fluid through the nozzle, and further can reduce thesuitable pressure levels capable of generating an oscillating fluid. Forexample, in some conventional nozzles, the nozzles may only be able toaccept fluid at a pressure of 0.7 bar to 1.4 bar (approximately 10-20psi) for proper operation.

The relatively straight flow paths of the nozzles according to exampleaspects of the present disclosure, however, allow for higher pressurefluids to be provided to the nozzle, such as, for example, fluids at apressure greater than 4.8 bar (approximately 70 psi). Further, higherpressure fluids can flow at higher velocities. This, in turn, can allowfor the oscillating fluids generated by the nozzles disclosed herein toachieve significantly higher momentums per droplet than oscillatingfluids generated by conventional nozzles. For example, oscillatingfluids generated by the nozzles disclosed herein can achieve momentumsper droplet an order of magnitude higher than oscillating fluidsgenerated by conventional nozzles.

Further, the nozzles and systems according to example aspects of thepresent disclosure can allow for oscillating fluid oscillate atapproximately 100 Hz, as compared to conventional nozzles whichtypically oscillate in the range of 400 to 500 Hz. The sloweroscillation frequency of oscillating fluid generated by nozzlesaccording to example aspects of the present disclosure can allow for theoscillating fluid to build up on a surface as the fluid contacts thesurface, which can aid in generating a wave of fluid to delaminatedebris from the surface. For example, rather than generating anoscillating spray which merely wets a surface, the nozzles according toexample aspects of the present disclosure can generate an oscillatingfluid jet which sweeps from side to side across the oscillation angle todelaminate debris from the surface.

Additionally, the nozzles and systems according to example aspects ofthe present disclosure can allow for a narrower oscillation angle thanis typically generated by conventional nozzles. For example,conventional nozzles may have an oscillation angle of 60° or higher, ascompared to the approximately 30° oscillation angle or variableoscillation angles generated by nozzles according to example aspects thepresent disclosure. These narrower oscillation angles can further aid indelaminating debris from a surface by, for example, focusing theoscillating fluid spray to a more confined area. Thus, the oscillatingfluid generated by nozzles according to example aspects the presentdisclosure can direct more oscillating fluid to a particular area of asurface than conventional nozzles.

Additionally, the nozzles and systems according to example aspects ofthe present disclosure can allow for a reduced amount of fluid to beused to clean the surface of the sensor. For example, the increasedmomentum of the oscillating fluid as compared to conventional nozzlescan allow for a rapid delamination of debris from the surface (e.g., inless than 500 ms). This can allow for very short duration sprays to beused in order to delaminate the debris. In some implementations, thenozzles and systems according to example aspects of the presentdisclosure can use approximately 75-80% less fluid than a conventionalnozzle.

Moreover, the nozzles and systems according to example aspects of thepresent disclosure can allow for the efficient removal of debris from asensor during operation of an autonomous vehicle, thereby enablingimproved operation of the sensor. Improved performance of the sensor canlead to improved performance of the autonomous vehicle motion control,which relies upon data collected by the one or more sensors tocomprehend the surrounding environment of the autonomous vehicle. Thus,the improved nozzles and cleaning systems of the present disclosure candirectly improve autonomous vehicle performance such as efficiency,safety, and passenger comfort.

Further, in implementations in which an adjustable nozzle is used, theoscillation frequency, oscillation angle, and the direction of flow ofthe oscillating fluid can be adjusted to delaminate debris from asensor. For example, in some operating conditions, a piece of debris maybe particularly resistant to delamination from the surface, such as bugdebris deposited on the surface at a high rate of speed. By adjustingthe oscillation angle, oscillation frequency, or direction of flow ofthe oscillating fluid, a targeted and/or increased flow of fluid can beprovided to the region of the surface in which the debris is located inorder to delaminate the debris from the surface.

With reference now to the FIGS., example aspects of the presentdisclosure will be discussed in further detail. FIG. 1 depicts a blockdiagram of an example autonomous vehicle 10 according to example aspectsof the present disclosure. The autonomous vehicle 10 can include one ormore sensors 101, a vehicle computing system 102, and one or morevehicle controls 107. The vehicle computing system 102 can assist incontrolling the autonomous vehicle 10. In particular, the vehiclecomputing system 102 can receive sensor data from the one or moresensors 101, attempt to comprehend the surrounding environment byperforming various processing techniques on data collected by thesensors 101, and generate an appropriate motion path through suchsurrounding environment. The vehicle computing system 102 can controlthe one or more vehicle controls 107 to operate the autonomous vehicle10 according to the motion path.

The vehicle computing system 102 can include one or more computingdevices 111. The one or more computing devices 111 can include one ormore processors 112 and one or more memory 114. The one or moreprocessors 112 can be any suitable processing device (e.g., a processorcore, a microprocessor, an ASIC, a FPGA, a computing device, amicrocontroller, etc.) and can be one processor or a plurality ofprocessors that are operatively connected. The one or more memory 114can include one or more non-transitory computer-readable storagemediums, such as RAM, ROM, EEPROM, EPROM, flash memory devices, magneticdisks, etc., and combinations thereof. The memory 114 can store data 116and instructions 118 which can be executed by the processor 112 to causevehicle computing system 102 to perform operations. The one or morecomputing devices 111 can also include a communication interface 119,which can allow the one or more computing devices 111 to communicatewith other components of the autonomous vehicle 10 or external computingsystems, such as via one or more wired or wireless networks.

As illustrated in FIG. 1, the vehicle computing system 102 can include aperception system 103, a prediction system 104, and a motion planningsystem 105 that cooperate to perceive the surrounding environment of theautonomous vehicle 10 and determine a motion plan for controlling themotion of the autonomous vehicle 10 accordingly. In someimplementations, the perception system 103, the prediction system 104,the motion planning system 105 can be included in or otherwise a part ofa vehicle autonomy system. As used herein, the term “vehicle autonomysystem” refers to a system configured to control the movement of anautonomous vehicle.

In particular, in some implementations, the perception system 103 canreceive sensor data from the one or more sensors 101 that are coupled toor otherwise included within the autonomous vehicle 10. As examples, theone or more sensors 101 can include a Light Detection and Ranging(LIDAR) system, a Radio Detection and Ranging (RADAR) system, one ormore cameras (e.g., visible spectrum cameras, infrared cameras, etc.),and/or other sensors. The sensor data can include information thatdescribes the location of objects within the surrounding environment ofthe autonomous vehicle 10.

As one example, for a LIDAR system, the sensor data can include thelocation (e.g., in three-dimensional space relative to the LIDAR system)of a number of points that correspond to objects that have reflected aranging laser. For example, a LIDAR system can measure distances bymeasuring the Time of Flight (TOF) that it takes a short laser pulse totravel from the sensor to an object and back, calculating the distancefrom the known speed of light.

As another example, for a RADAR system, the sensor data can include thelocation (e.g., in three-dimensional space relative to the RADAR system)of a number of points that correspond to objects that have reflected aranging radio wave. For example, radio waves (e.g., pulsed orcontinuous) transmitted by the RADAR system can reflect off an objectand return to a receiver of the RADAR system, giving information aboutthe object's location and speed. Thus, a RADAR system can provide usefulinformation about the current speed of an object.

As yet another example, for one or more cameras, various processingtechniques (e.g., range imaging techniques such as, for example,structure from motion, structured light, stereo triangulation, and/orother techniques) can be performed to identify the location (e.g., inthree-dimensional space relative to the one or more cameras) of a numberof points that correspond to objects that are depicted in imagerycaptured by the one or more cameras. Other sensor systems can identifythe location of points that correspond to objects as well.

As another example, the one or more sensors 101 can include apositioning system. The positioning system can determine a currentposition of the vehicle 10. The positioning system can be any device orcircuitry for analyzing the position of the vehicle 10. For example, thepositioning system can determine a position by using one or more ofinertial sensors, a satellite positioning system, based on IP address,by using triangulation and/or proximity to network access points orother network components (e.g., cellular towers, WiFi access points,etc.) and/or other suitable techniques. The position of the vehicle 10can be used by various systems of the vehicle computing system 102.

Thus, the one or more sensors 101 can be used to collect sensor datathat includes information that describes the location (e.g., inthree-dimensional space relative to the autonomous vehicle 10) of pointsthat correspond to objects within the surrounding environment of theautonomous vehicle 10. In some implementations, the sensors 101 can belocated at various different locations on the autonomous vehicle 10. Asan example, in some implementations, one or more cameras and/or LIDARsensors can be located in a pod or other structure that is mounted on aroof of the autonomous vehicle 10 while one or more RADAR sensors can belocated in or behind the front and/or rear bumper(s) or body panel(s) ofthe autonomous vehicle 10. As another example, camera(s) can be locatedat the front or rear bumper(s) of the vehicle 10 as well. Otherlocations can be used as well.

In addition to the sensor data, the perception system 103 can retrieveor otherwise obtain map data 126 that provides detailed informationabout the surrounding environment of the autonomous vehicle 10. The mapdata 126 can provide information regarding: the identity and location ofdifferent travelways (e.g., roadways), road segments, buildings, orother items or objects (e.g., lampposts, crosswalks, curbing, etc.); thelocation and directions of traffic lanes (e.g., the location anddirection of a parking lane, a turning lane, a bicycle lane, or otherlanes within a particular roadway or other travelway); traffic controldata (e.g., the location and instructions of signage, traffic lights, orother traffic control devices); and/or any other map data that providesinformation that assists the vehicle computing system 102 incomprehending and perceiving its surrounding environment and itsrelationship thereto.

The perception system 103 can identify one or more objects that areproximate to the autonomous vehicle 10 based on sensor data receivedfrom the one or more sensors 101 and/or the map data 126. In particular,in some implementations, the perception system 103 can determine, foreach object, state data that describes a current state of such object(also referred to as features of the object). As examples, the statedata for each object can describe an estimate of the object's: currentlocation (also referred to as position); current speed (also referred toas velocity); current acceleration; current heading; currentorientation; size/shape/footprint (e.g., as represented by a boundingshape such as a bounding polygon or polyhedron); type/class (e.g.,vehicle versus pedestrian versus bicycle versus other); yaw rate;distance from the autonomous vehicle; minimum path to interaction withthe autonomous vehicle; minimum time duration to interaction with theautonomous vehicle; and/or other state information.

In some implementations, the perception system 103 can determine statedata for each object over a number of iterations. In particular, theperception system 103 can update the state data for each object at eachiteration. Thus, the perception system 103 can detect and track objects(e.g., vehicles) that are proximate to the autonomous vehicle 10 overtime.

The prediction system 104 can receive the state data from the perceptionsystem 103 and predict one or more future locations for each objectbased on such state data. For example, the prediction system 104 canpredict where each object will be located within the next 5 seconds, 10seconds, 20 seconds, etc. As one example, an object can be predicted toadhere to its current trajectory according to its current speed. Asanother example, other, more sophisticated prediction techniques ormodeling can be used.

The prediction system 104 can create prediction data associated witheach of the respective one or more objects within the surroundingenvironment of the vehicle 10. The prediction data can be indicative ofone or more predicted future locations of each respective object. Forexample, the prediction data can be indicative of a predicted trajectory(e.g., predicted path) of at least one object within the surroundingenvironment of the vehicle 10. For example, the predicted trajectory(e.g., path) can indicate a path along which the respective object ispredicted to travel over time (and/or the speed at which the object ispredicted to travel along the predicted path).

For example, in some implementations, the prediction system 104 can be agoal-oriented prediction system that generates one or more potentialgoals, selects one or more of the most likely potential goals, anddevelops one or more trajectories by which the object can achieve theone or more selected goals. For example, the prediction system 104 caninclude a scenario generation system that generates and/or scores theone or more goals for an object and a scenario development system thatdetermines the one or more trajectories by which the object can achievethe goals. In some implementations, the prediction system 104 caninclude a machine-learned goal-scoring model, a machine-learnedtrajectory development model, and/or other machine-learned models.

In some implementations, the predictions system 104 can use state dataindicative of an object type or classification to predict a trajectoryfor the object. As an example, the prediction system 104 can use statedata provided by the perception system 103 to determine that particularobject (e.g., an object classified as a vehicle) approaching anintersection and maneuvering into a left-turn lane intends to turn left.In such a situation, the prediction system 104 can predict a trajectory(e.g., path) corresponding to a left-turn for the vehicle such that thevehicle turns left at the intersection. Similarly, the prediction system104 can determine predicted trajectories for other objects, such asbicycles, pedestrians, parked vehicles, etc. The prediction system 104can provide the predicted trajectories associated with the object(s) tothe motion planning system 105.

The motion planning system 105 can determine a motion plan for theautonomous vehicle 10 based at least in part on the predictedtrajectories associated with the objects within the surroundingenvironment of the vehicle and/or the state data for the objectsprovided by the perception system 103. Stated differently, giveninformation about the current locations of objects and/or predictedtrajectories of objects within the surrounding environment of theautonomous vehicle 10, the motion planning system 105 can determine amotion plan for the autonomous vehicle 10 that best navigates theautonomous vehicle 10 relative to the objects at such locations andtheir predicted trajectories.

In some implementations, the motion planning system 105 can evaluate oneor more cost functions and/or one or more reward functions for each ofone or more candidate motion plans for the autonomous vehicle 10. Forexample, the cost function(s) can describe a cost (e.g., over time) ofadhering to a particular candidate motion plan while the rewardfunction(s) can describe a reward for adhering to the particularcandidate motion plan. For example, the reward can be of opposite signto the cost.

Thus, given information about the current locations and/or predictedfuture locations/trajectories of objects, the motion planning system 105can determine a total cost (e.g., a sum of the cost(s) and/or reward(s)provided by the cost function(s) and/or reward function(s)) of adheringto a particular candidate pathway. The motion planning system 105 canselect or determine a motion plan for the autonomous vehicle 10 based atleast in part on the cost function(s) and the reward function(s). Forexample, the motion plan that minimizes the total cost can be selectedor otherwise determined. The motion plan can be, for example, a pathalong which the autonomous vehicle 10 will travel in one or moreforthcoming time periods. The motion planning system 105 can provide theselected motion plan to a vehicle controller 106 that controls one ormore vehicle controls 107 (e.g., actuators or other devices that controlgas flow, steering, braking, etc.) to execute the selected motion plan.In some implementations, the motion planning system 105 can beconfigured to iteratively update the motion plan for the autonomousvehicle 10 as new sensor data is obtained from one or more sensors 101.For example, as new sensor data is obtained from one or more sensors101, the sensor data can be analyzed by the perception system 103, theprediction system 104, and the motion planning system 105 to determinethe motion plan.

Each of the perception system 103, the prediction system 104, and themotion planning system 105 can be included in or otherwise a part of avehicle autonomy system configured to determine a motion plan based atleast in part on data obtained from one or more sensors 101. Forexample, data obtained by one or more sensors 101 can be analyzed byeach of the perception system 103, the prediction system 104, and themotion planning system 105 in a consecutive fashion in order to developthe motion plan. While FIG. 1 depicts elements suitable for use in avehicle autonomy system according to example aspects of the presentdisclosure, one of ordinary skill in the art will recognize that othervehicle autonomy systems can be configured to determine a motion planfor an autonomous vehicle based on sensor data.

Each of the perception system 103, the prediction system 104, the motionplanning system 105, and the vehicle controller 106 can include computerlogic utilized to provide desired functionality. In someimplementations, each of the perception system 103, the predictionsystem 104, the motion planning system 105, and the vehicle controller106 can be implemented in hardware, firmware, and/or softwarecontrolling a general purpose processor. For example, in someimplementations, each of the perception system 103, the predictionsystem 104, the motion planning system 105, and the vehicle controller106 includes program files stored on a storage device, loaded into amemory and executed by one or more processors. In other implementations,each of the perception system 103, the prediction system 104, the motionplanning system 105, and the vehicle controller 106 includes one or moresets of computer-executable instructions that are stored in a tangiblecomputer-readable storage medium such as RAM hard disk or optical ormagnetic media.

The autonomous vehicle 10 can further include a sensor cleaning system200 configured to clean one or more sensors 101 of the autonomousvehicle 10.

FIG. 2 depicts a block diagram of an example fluid-based (e.g., liquid,air) sensor cleaning system 200 according to example embodiments of thepresent disclosure. The fluid-based sensor cleaning system 200 can beincluded in an autonomous vehicle 10 to clean the sensors 101 of theautonomous vehicle 10.

In particular, as shown, the system 200 is a pressurized-gas, liquidcleaning system 200. In various other implementations, the system 200can be a hydraulic pressurized fluid cleaning system, such as liquidpressurized via one or more pumps. Further, in some implementations, thesystem 200 can be a pressurized gas cleaning system, wherein thecleaning fluid can be pressurized gas (e.g., compressed air), such asfrom a source of pressurized gas 206.

The fluid-based sensor cleaning system 200 of FIG. 2 includes a pressuretransfer device 204. The pressure transfer device 204 can receive liquidfrom a liquid reservoir 202. For example, the liquid reservoir 202 canbe a windshield washer reservoir of the autonomous vehicle. In someimplementations, the liquid fluid can be windshield washer fluid,methanol, propylene glycol, antifreeze, and/or ethanol.

In some implementations, the pressure transfer device 204 can pullliquid from the liquid reservoir 202. For example, the pressure transferdevice 204 can include an internal mechanism that operates to drawliquid from the liquid reservoir 202 to the pressure transfer device204. In one example, such internal mechanism includes a biasing element(e.g., a mechanical spring) that biases a partition included in thepressure transfer device 204 toward increasing a volume of a liquidchamber in the device 204, thereby pulling liquid from the reservoir 202to the device 204. In other implementations, the system 200 can includea pump (not illustrated) that actively pumps or pushes the liquid fromthe liquid reservoir 202 to the pressure transfer device 204. The pumpcan be controlled (e.g., by the one or more controllers 250) based onknowledge of an amount of liquid included in the pressure transferdevice 204 and/or the liquid tank 208. For example, various sensors orother components can be used to monitor the amount of liquid included inthe pressure transfer device 204 and/or the liquid tank 208. Whenadditional liquid is desired, the pump is operated to pump liquid fromthe reservoir 202 to the pressure transfer device 204.

Referring still to FIG. 2, the pressure transfer device 204 can usepressurized gas 206 to pressurize the liquid received from the liquidreservoir 202. Liquid pressurized by the pressure transfer device can bestored in a liquid tank 208. For example, the liquid tank 208 can be aliquid accumulator. In some implementations, the liquid tank 208 and thepressure transfer device 204 can be integrated together into a singlecomponent. The liquid reservoir 202, pressure transfer device 204,pressurized gas 206, the liquid tank 208, a liquid pump (not shown), orany other suitable fluid source can be included in or otherwise form apart of a fluid source, source of pressurized fluid, or source of highpressure fluid, as those terms are used herein. The components 202-208shown in FIG. 2 are illustrative of one example fluid source, but one ofordinary skill in the art will recognize that any number of fluidsources can be used to provide a pressurized fluid in a cleaning system,as described herein.

In some implementations, the liquid reservoir 202, pressure transferdevice 204, pressurized gas 206, the liquid tank 208, and/or any otherfluid source can be a high pressure fluid source. For example, in someimplementations, the fluid stored in the liquid tank 208 and/or thepressurized gas 206 can be at a pressure greater than 4.8 bar(approximately 70 psi). Referring still to FIG. 2, the pressurized fluidprovided by the pressure transfer device 204 and/or stored in the tank208 can be respectively provided to a plurality of flow control devices212, 214, and 216.

The fluid-based sensor cleaning system 200 can also include a pluralityof nozzles, as shown at 222, 224, and 226. Although three nozzles222-226 are shown, any number of nozzles can be included in the system200. Each nozzle 222-226 can use the pressurized fluid (e.g.,pressurized liquid, compressed air) to clean a respective sensor, asshown at 232, 234, and 236. The sensors 232-236 can correspond to, forexample, individual sensors 101 depicted in FIG. 1. For example, eachnozzle 222-226 can spray or otherwise release the pressurized fluid ontothe sensor (e.g., a lens, cover, housing, or other portion of thesensor) to remove contaminants or other debris from the sensor (e.g.,from the lens, cover, housing, or other portion of the sensor). In someimplementations, one or more of the nozzles 222-226 can include a nozzlethat sprays the pressurized fluid onto the sensor 232-236 to clean thesensor 232-236. In some implementations, each nozzle 222-226 can beintegral to the corresponding sensor 232-236.

The fluid-based sensor cleaning system 200 can also include theplurality of flow control devices, as shown at 212, 214, and 216. Theflow control devices 212-216 can respectively control a flow of thepressurized fluid from the pressure transfer device 204 and/or theliquid tank 208 to the plurality of nozzles 222-226.

The sensor cleaning system 200 can further include one or morecontrollers 250 (also referred to as a computing device). The one ormore controllers 250 can individually control each flow control device212-216 to allow the flow of the pressurized fluid to the correspondingnozzle 222-226 to enable the corresponding nozzle 222-226 toindividually clean the corresponding sensor 232-236, such as accordingto a spray pattern.

The one or more controllers 250 can include one or more control devices,nozzles, or components that interface with or otherwise control the oneor more flow control devices 212-216. As examples, a controller 250 caninclude one or more chips (e.g., ASIC or FPGA), expansion cards, and/orelectronic circuitry (e.g., amplifiers, transistors, capacitors, etc.)that are organized or otherwise configured to control one or more flowcontrol devices (e.g., by way of control signals). In someimplementations, a controller 250 can include a processor that loads andexecutes instructions stored in a computer-readable media to performoperations.

In some implementations, the one or more controllers 250 include asingle controller. In some implementations, the one or more controllers250 include a plurality of controllers that respectively control theplurality of flow control devices 212-216. In some implementations, theone or more controllers 250 can be physically located on a controlboard. For example, the control board can be physically coupled to aflow control device manifold, as described below.

In some implementations, the plurality of flow control devices 212-216can include a plurality of solenoids that are individually controllableby the one or more controllers 250 to respectively allow or impede theflow of the pressurized fluid to the corresponding nozzle 222-226. Thatis, the one or more controllers 250 can individually control eachsolenoid to control the respective flow of liquid to the correspondingnozzle 222-226, thereby enabling cleaning of each sensor 232-236according to a respective spray pattern for the sensor 232-236.

In some implementations, one or more of the flow control devicemanifolds (e.g., solenoid manifolds) can be integrated with the liquidtank 208. As an example, a solenoid manifold that controls therespective flow of the pressurized fluid to the nozzles 222-226 can bephysically located within a pressurized volume of the fluid stored by aliquid tank 208. In some implementations, the one or more controllers250 can also be integrated with the liquid tank 208.

Inclusion of the flow control device manifold within the liquid tank 208enables such components to be provided as a single package, therebysaving space. Inclusion of the flow control device manifold within theliquid tank 208 also decreases the respective fluid flow distances fromthe tank 208 to the nozzles 222-226, thereby eliminating pressure lossdue to hose length and, conversely, increasing pressure of the fluidwhen used by the nozzles 222-226.

In addition, in some implementations, the integrated liquid tank canfurther include valves, a pressure sensor, and/or controls coupledthereto or otherwise integrated therewith.

In some implementations, an entirety of the sensor cleaning system 200exclusive of wiring is physically located external to a cab of theautonomous vehicle. As one example, all system components except for theliquid reservoir 202 can be located on the roof of the vehicle (e.g., inthe pod mounted on the roof of the vehicle). For example, the liquidreservoir 202 can be located under a hood of the vehicle. In addition,in some implementations, the entirety of the sensor cleaning system 200inclusive of wiring is physically located external to the cab of theautonomous vehicle.

In some implementations, the sensor cleaning system 200 can furtherinclude a controller area network. For example, the one or morecontrollers 250 can transmit control signals on the controller areanetwork to control the plurality of flow control devices 212-216. Use ofa controller area network by the sensor cleaning system 200 contrastswith the more typical use of a local interconnect network in vehicularapplications. Use of a controller area network enables use a messagebroadcast and renders the sensor cleaning system 200 infinitely scalablefrom a communications perspective.

As one example, in some implementations, at least two or more of theflow control devices 212-216 can be integrated into the liquid tank 208,as described above. The integrated tank can include a number ofconnection pins that receive control signals from the controller areanetwork. In some implementations, the control signals that control theflow control devices 212-216 can include a sequence signal and a firingorder signal that instruct the integrated tank how to control thecorresponding flow control devices 212-216. In one example, theintegrated tank can have four connection pins that respectivelycorrespond to power, ground, sequence, and firing order.

An advantage provided by the example cleaning systems 200 of the presentdisclosure is the ability to use a high pressure fluid to clean one ormore sensors 232-236 of an autonomous vehicle 10. Using a high pressurefluid can allow for increased delamination of debris from a sensor232-236.

Referring now to FIG. 3, a top down view of an example nozzle 300according to example aspects of the present disclosure is depicted. Thenozzle 300 can be used in a cleaning system 200, and can correspond tothe nozzles 222-226 depicted in FIG. 2. As shown, the nozzle 300 caninclude a baseplate 310. The baseplate 310 can include an inlet 320,oscillator 330, and an outlet 340. The inlet 320 can be configured toreceive a high pressure fluid, such as a high-pressure liquid from aliquid tank 208 or pressurized air from source of a pressurized gas 206.The inlet 320 can coupled with the oscillator 330 such that the inlet320 is in fluid communication with the oscillator 330. For example,fluid flowing into the inlet 320 can flow into the oscillator 330.Similarly, the oscillator 330 can be coupled with the outlet 340 suchthat the oscillator 330 is in fluid communication with the outlet 340.For example, fluid flowing into the oscillator 330 can exit the nozzle300 via the outlet 340.

The oscillator 330 can be associated with a longitudinal direction L anda tangential direction T. The tangential direction T can be generallyperpendicular to the longitudinal direction L. An upstream direction Ucan run parallel to the longitudinal direction L. Fluid can enter theinlet 320 at the upstream direction U, flow generally through the nozzle300 along the longitudinal direction L, and exit the nozzle 300 via theoutlet 340 at the downstream direction D. Thus, fluid can generally flowfrom the upstream direction U to the downstream direction D.

In some implementations, the inlet 320 can include a first inlet wall321 and a second inlet wall 322. The first inlet wall 321 can include afirst portion and a second portion. For example, the first portion canbe at an upstream direction of the first inlet wall 321, and the secondportion can be at a downstream direction of the first inlet wall 321.Similarly, the second inlet wall 322 can include a first portion and asecond portion. The first portion can be at an upstream direction of thesecond inlet wall 322 and the second portion can be at a downstreamdirection of the second inlet wall 322. The second inlet wall 322 can beopposite the first inlet wall 321, such as on an opposite side of thenozzle 300 along the tangential direction T from the first inlet wall321.

The first portion of the first inlet wall 321 and the first portion ofthe second inlet wall 322 can together define an opening O configured toreceive a pressurized fluid, such as a high pressure fluid. For example,in various implementations, the opening of the inlet 320 can includevarious couplers, connectors, or other adapters to allow the opening toreceive the pressurized fluid, such as via a threaded, pressure fit, orother connection.

The second portion of the first inlet wall 321 and the second portion ofthe second inlet wall 322 can together define a first throat TH₁ havinga first width. As shown, the first inlet wall 321 and the second inletwall 322 can narrow from the opening O to the first throat TH₁.

The inlet 320 can provide an unimpeded path of fluid flow to theoscillator. For example, as shown, the inlet 320 does not include anyobstructions in the path of fluid flow from the inlet to the oscillator,such as posts, diverters, or other obstructions. Rather, the inlet 320includes two sidewalls which narrow to a throat, but do not impede thepath of fluid flow, such as in an inlet including posts or diverters.

In some implementations, the fluid received at the inlet 320 can be ahigh pressure fluid at a pressure of greater than 4.8 bar. For example,the inlet 320 can be coupled to a supply line which can be coupled to asource of high pressure fluid (e.g., liquid tank 208) in someimplementations, a flow control device can be coupled between the inlet320 and the source of high pressure fluid to allow or impede the flow ofthe high pressure fluid to the nozzle 300. The fluid (e.g., liquid,compressed air) received at the inlet 320 at a pressure of greater than4.8 bar. In some implementations, the high-pressure fluid can be at apressure within a range of 4.8 bar to 6.2 bar. In some implementations,the high pressure fluid can be at any suitable pressure.

The oscillator 330 can be configured to receive the pressurized fluidfrom the inlet and generate an oscillating fluid. For example, in someimplementations, the oscillator 330 can include a first side wall 331, asecond side wall 332, a first oscillation wall 333, and a secondoscillation wall 334. The first oscillation wall 333 and the first sidewall 331 can together define a first bypass tube 335, and the secondoscillation wall 334 and the second side wall 332 can together define asecond bypass tube 336. In some implementations, the first bypass tube335 can have a first bypass width B₂, and the second bypass tube 336 canhave a second bypass width B₁. The first bypass width B₂ and/or thesecond bypass width B₁ can be, for example, the width between the firstside wall 331 and the first oscillation wall 333 or the second sidewall332 and the second oscillation wall 334, respectively.

In some implementations, the first oscillation wall 333 and the secondoscillation wall 334 can together define a mixing chamber 337. Further,the first oscillation wall 333 and the second oscillation wall 334 cantogether define a second throat TH₂ having a second width and a thirdthroat TH₃ having a third width. The second throat TH₂ can be at anupstream portion of the mixing chamber 337 and the third throat TH₃ canbe at a downstream portion of the mixing chamber 337. The mixing chambercan further define a maximum width W along the tangential directionbetween the second throat and the third throat. In some implementations,the width of the second throat TH₂ and the width of the third throat TH₃can be less than the maximum width W. For example, the mixing chamber337 can widen from the second throat TH₂ to the maximum width W, andnarrow from the maximum width W to the third throat TH₃.

In some implementations, the first oscillation wall 333 can include afirst bumper 338 at a downstream portion of the first oscillation wall333. Similarly, the second oscillation wall 334 can include a secondbumper 339 at a downstream portion of the second oscillation wall 334.Each bumper 338/339 can define a bumper length T₁ along the longitudinaldirection. For example, in some implementations, the first bumper 338and the second bumper 339 can be the same length.

As the pressurized fluid flows from the inlet 320 into the oscillator330, a first portion of the fluid can flow into the first bypass tube335, and a second portion of the fluid can flow into the second bypasstube 336. A third portion of the fluid can flow into the mixing chamber.As the first portion and the second portion flow through the firstbypass tube 335 and the second bypass tube 336, respectively, a portionof each of the first portion and the second portion can flow around thefirst bumper 338 and the second bumper 339, respectively, and into themixing chamber 337. In some implementations, each bumper can include agenerally convex portion configured to assist in directing a flow fromeach respective bypass tube into the mixing chamber. This flow can causealternating pressure differentials to build up on the first oscillationwall 333 and the second oscillation wall 334 in order to cause the flowof the fluid to oscillate. In this way, the oscillator 330 can beconfigured to receive the pressurized fluid (e.g., a high pressurefluid) from the inlet 320 generate an oscillating flow.

The outlet 340 can be configured to receive the flow of the oscillatingfluid from the oscillator 330. The outlet 340 can include a first exitwall 341 proximate to the first bypass tube 335, and a second exit wall342 proximate to the second bypass tube 336. The first and second exitwalls 341/342 can together define a fourth throat TH₄ having a fourthwidth and an exit E. In some implementations, the outlet can narrow fromthe fourth throat TH₄ to the exit E.

The outlet 340 can be configured to receive the oscillating fluid andprovide the oscillating fluid to a surface to delaminate debris from thesurface. For example, the outlet 340 can be configured to eject theoscillating fluid onto the surface of a sensor 101 in order todelaminate debris from the sensor 101.

In some implementations, the outlet can include exit side walls 343 and344, such as at a flared portion downstream of the exit E. For example,in some implementations, the flared portion can flare across an angle ofapproximately 60°.

Referring now to FIG. 4, a side view of the example nozzle 300 of FIG. 3is depicted. As shown, the nozzle 300 can include the baseplate 310 anda top 360. Also depicted is the outlet 340.

In some implementations, the baseplate 310 and/or top 360 can bemanufactured out of a single piece of material. For example, in someimplementations, the baseplate 310 and/or top 360 can be milled from asolid piece of material (e.g., aluminum, steel, plastic). For example,the inlet 320, bypass flow tubes 342/344, mixing chamber 346, and outlet340 can be cut into a solid piece of material, thereby creating a floor370 on the baseplate and the various fluid flow pathways of the nozzle300. In some implementations, the baseplate 310 and/or top 360 can bemanufactured by additive manufacturing, injection molding, or any othersuitable process.

In some implementations, the top 360 can be manufactured out of the sameor similar material as the baseplate 310, such as metal or plastic, andcan be attached to the baseplate 310 in order to enclose the variouschambers. The top 360 can be attached to the baseplate 310 in order toenclose the inlet 320, the oscillator 330, and the outlet 340. Forexample, in some implementations, the top 360 can be attached to thebaseplate 310 via laser welding, ultrasonic welding, brazing,conventional welding, coupling via one or more fasteners (e.g., screws),or any other suitable method. In such fashion, the nozzle 300 can becomeessentially air and/or watertight, excepting the opening and the exit.In some implementations, the top 360 can be essentially parallel to thefloor 370 of the baseplate 310.

Although FIGS. 3 and 4 depict the baseplate 310 and top 360 as separatepieces, one of ordinary skill in the art will recognize that in someimplementations, the nozzle 300 can be manufactured such that thebaseplate 310 and top 360 are constructed out of a single piece ofmaterial, such as via casting, injection molding, additivemanufacturing, etc.

Referring now to FIG. 5, a nozzle 300 according to example aspects ofthe present disclosure is depicted. The nozzle 300 can be the same orsimilar nozzle 300 as depicted in FIG. 3. However, in someimplementations as depicted in FIG. 5, the opening O, throats TH₁-TH₄,maximum Width W, bumper length T₁, bypass tube widths B₁ and B₂, andexit E can have various ratios to one another.

For example, in some implementations, the ratio of the first throat TH₁to the bumper length T₁ of each oscillation wall 333/334 can beapproximately 1.0. As used herein, the term approximately when used inreference to a ratio means within plus or minus 20% of the stated value.For example, the bumper length T₁ can be a specific width, and the widthof the first throat TH₁ can be approximately the same width as thebumper length T₁.

In some implementations, the ratio of the width of the opening O to thewidth of the first throat TH₁ can be approximately 2.8. For example, theopening O of the inlet can be approximately 2.8 times wider than thewidth of the first throat TH₁. In some implementations, the ratio of thewidth of the opening O to the width of the first throat TH₁ can bewithin a range of 2.24 to 3.36.

In some implementations, the ratio of the width of the second throat TH₂to the width of the first throat TH₁ can be approximately 1.25. Forexample, the second throat TH₂ in the oscillator can be approximately1.25 times wider than the width of the first throat TH₁. Thus, thesecond throat TH₂ can be wider than the first throat TH₁, which canallow the flow of fluid to expand as it enters the second throat TH₂from the first throat TH₁. In some implementations, the ratio of thewidth of the second throat TH₂ to the width of the first throat TH₁ canbe within a range of 1.0 to 1.5.

In some implementations, the ratio of the width of the third throat TH₃to the width of the first throat TH₁ can be approximately 2.4. Forexample, the third throat TH₃ can be approximately 2.4 times wider thanthe width of the first throat TH₁. In some implementations, the ratio ofthe width of the third throat TH₃ to the width of the first throat TH₁can be within a range of 1.92 to 2.88.

In some implementations, the ratio of the width of the maximum width Wof the mixing chamber to the first throat TH₁ can be approximately 3.5.For example, the maximum width W of the mixing chamber can beapproximately 3.5 times wider than the width of the first throat TH₁. Insome implementations, the ratio of the width of the maximum width W tothe width of the first throat TH₁ can be within a range of 2.8 to 4.2.

In some implementations, the ratio of the width of the fourth throat TH₄to the width of the first throat TH₁ can be approximately 2.0. Forexample, the fourth throat TH₄ in the oscillator can be approximately2.0 times wider than the width of the first throat TH₁. In someimplementations, the ratio of the width of the fourth throat TH₄ to thewidth of the first throat TH₁ can be within a range of 1.6 to 2.2.

In some implementations, the exit E of the outlet can be narrower thanthe first throat TH₁. For example, the ratio of the width of the exit Eto the width of the first throat TH₁ can be approximately 0.8. In someimplementations, the ratio of the width of the exit E to the width ofthe first throat TH₁ can be within a range of 0.64 to 0.96.

In some implementations, the ratio of the bypass width B₁ or B₂ to thewidth of the first throat TH₁ can be approximately 0.6. For example, thebypass width B₁ or B₂ of each bypass tube can be narrower than the firstthroat TH₁. In some implementations, the ratio of the bypass width B₁ orB₂ of each bypass tube to the width of the first throat TH₁ can bewithin a range of 0.48 to 0.72.

Referring now to FIG. 6, an example nozzle providing an oscillatingspray according to example aspects of the present disclosure isdepicted. For example, as the oscillating fluid exits the outlet 340 ofa nozzle 300, an oscillating fluid 610 can be sprayed to, for example,delaminate debris from a surface.

In some implementations, the oscillating fluid 610 can oscillate at afrequency of approximately 100 Hz. For example, in some implementations,the oscillating fluid can oscillate at a frequency within a range of 80Hz to 120 Hz.

The oscillating fluid can oscillate from side to side, and the sweepingmotion can assist in delaminating debris from the surface. In someimplementations, the oscillating fluid can oscillate across anoscillation angle θ of approximately 30°. For example, in someimplementations, the oscillating fluid can oscillate within a range of25° to 35°. For example, the longitudinal direction of the nozzle cancorrespond to a centerline C of oscillating fluid flow. The oscillatingfluid 610 can oscillate from approximately 15° on one side of thecenterline C to 15° on the opposite side of the centerline C, thushaving an oscillation angle θ of approximately 30°. The flow of theoscillating fluid 610 can sweep from one side of the centerline C to theother side of the centerline, thus oscillating between the two sides.

Referring now to FIGS. 7 and 8, an example nozzle configured to cleanthe surface of a sensor according to example aspects of the presentdisclosure is depicted. For example, FIG. 7 depicts a perspective viewof an example nozzle 300 cleaning a surface 704, while FIG. 8 depicts aside view of an example nozzle 300 cleaning a surface 704.

As shown, an oscillating fluid 610 can exit the outlet 340 of a nozzle300 and be sprayed onto a surface 704. For example, the oscillatingfluid 600 can be used to delaminate debris from the surface 704. In someimplementations, the surface 704 can be a surface 704 of a sensor101/232-236.

In some implementations, the nozzle 300 can be positioned at an angle ofinclination ft to a surface 704 of approximately 14-16°. For example, asshown in FIG. 8, a nozzle 300 is positioned at an angle of inclination βof approximately 15°. In other implementations, the nozzle 300 can bepositioned at an angle of inclination β within a range of 9° to 21° tothe surface 704. Positioning the nozzle 300 at an angle of inclinationβ, such as between 9° to 21°, can assist in delaminating debris from thesurface, as the oscillating fluid 610 can accumulate and form a wave onthe surface 704. As the wave of oscillating fluid 610 travels across thesurface 704, debris deposited on the surface can be removed. Forexample, positioning the nozzle 300 at an angle of inclination ofapproximately β between 9° to 21° can allow for the oscillating fluid610 to flow underneath debris to dislodge/delaminate the debris, whilestill having sufficient lateral momentum to carry the debris off of thesurface.

Referring now to FIG. 9, a perspective view of an example adjustablenozzle 900 according to additional example aspects of the presentdisclosure is depicted. For example, in some implementations, anadjustable nozzle 900 can be used as a nozzle 222-226 in a cleaningsystem 200.

The adjustable nozzle 900 can include similar components as a nozzle300, with a primary difference being that the adjustable nozzle 900includes an adjustable oscillator 930. For example, an adjustable nozzle900 can include an inlet 920. The inlet 920 can be configured to receivea pressurized fluid, such as pressurized air (e.g. compressed air) orpressurized liquid. In some implementations, the pressurized fluid canbe a high-pressure fluid, such as a fluid at a pressure greater than 4.8bar.

The adjustable oscillator 930 can be coupled with the inlet 920. Forexample, the adjustable oscillator 930 can be in fluid communicationwith the inlet 920 such that the pressurized fluid can flow from theinlet 920 into the adjustable oscillator 930. In this way, theadjustable oscillator can be configured to receive the pressurized fluidfrom the inlet 920. Further, the adjustable oscillator 930 can beconfigured to generate an oscillating fluid. The adjustable nozzle 900can further include an outlet 940 coupled with the adjustable oscillator930. The outlet 940 can be configured to receive the oscillating fluidand eject the oscillating fluid from the adjustable nozzle 900.

The adjustable oscillator 930 can be associated with a longitudinaldirection L and a tangential direction T. The tangential direction T canbe generally perpendicular to the longitudinal direction L. An upstreamdirection U can run parallel to the longitudinal direction L. Fluid canenter the inlet 920 at the upstream direction U, flow generally throughthe nozzle 900 along the longitudinal direction L, and exit the nozzle900 via the outlet 940 at the downstream direction D. Thus, fluid cangenerally flow from the upstream direction U to the downstream directionD.

The adjustable oscillator 930 can include a first oscillation wall 950and a second oscillation wall 960. The first oscillation wall 950 caninclude a first adjustable chamber modifier wall 951. Similarly,oscillation wall 960 can include a second adjustable chamber modifierwall 961. The first adjustable chamber modifier wall 951 and the secondadjustable chamber modifier wall 961 can together define an adjustablemixing chamber 970. The adjustable mixing chamber 970 can be configuredto generate the oscillating fluid, which can have one or more propertiesthat are adjustable by the first adjustable chamber modifier wall 951 orthe second adjustable chamber modifier wall 961. For example, in someimplementations, the one or more properties of the oscillating fluidthat the first adjustable chamber modifier wall 951 and/or the secondadjustable chamber modifier wall 961 can be configured to adjust caninclude an oscillation frequency, an oscillation angle, or a directionof a flow of the oscillating fluid.

The adjustable oscillator 930 can further include a first sidewall 952and a second side wall 962. The first oscillation wall 950 can alsoinclude a first bypass wall 953. Similarly, the second oscillation wall960 can include a second bypass wall 963. The first bypass wall 953 andthe first sidewall 952 can together define a first bypass tube 954, andthe second bypass wall 963 and the second sidewall 962 can togetherdefine a second bypass tube 964. The first bypass tube 954 and thesecond bypass tube 964 can be similar to and have similar functionalityas the first bypass tube 335 and second bypass tube 336, as depicted inFIG. 3. For example, a first portion of the flow of the pressurizedfluid received the inlet 920 can flow into the first bypass tube 954,and a second portion of the pressurized fluid received at the inlet 920can flow through the second bypass tube 964.

The first oscillation wall 950 can further include a first upstreamflexure 955 at an upstream portion of the first oscillation wall 950 anda first downstream flexure 956 at a downstream portion of the firstoscillation wall 950. Similarly, the second oscillation wall 960 caninclude a second upstream flexure 965 at an upstream portion of thesecond oscillation wall 960 and a second downstream flexure 966 at adownstream portion of the second oscillation wall 960. The firstadjustable chamber modifier wall 951 can be connected to the firstbypass wall 953 by the first upstream flexure 955 and the firstdownstream flexure 956. Similarly, the second adjustable chambermodifier wall 961 can be coupled to the second bypass wall 963 by thesecond upstream flexure 965 and the second downstream flexure 966. Eachof the first upstream flexure 955, the first downstream flexure 956, thesecond upstream flexure 965, and the second downstream flexure 966 canbe independently movable to adjust the adjustable mixing chamber. Forexample, in some implementations, the flexures 955/956/965/966 can bemolded out of a flexible plastic, such as via an injection moldingprocess. The first adjustable chamber modifier wall 951 and the secondadjustable chamber modifier wall 961 can be disconnected from a floor971 of the adjustable nozzle 930 such that the first adjustable chambermodifier wall 951 and the second adjustable chamber modifier wall 961can move generally along the tangential direction T to adjust theadjustable mixing chamber 970.

For example, the first adjustable chamber modifier wall 951 and thesecond adjustable chamber modifier wall 961 can together define a firstthroat TH₁ at an upstream portion (i.e., upstream throat) of theadjustable oscillator 930 and a second throat TH₂ at a downstreamportion (i.e., downstream throat) of the adjustable oscillator 930. Thewidth of the first throat TH₁ and the width of the second throat TH₂ canbe adjusted by moving the first adjustable chamber modifier wall 951 andsecond adjustable chamber modifier wall 961. For example, an upstreamportion or a downstream portion of the first adjustable chamber modifierwall 951 can move generally along the tangential direction T to extendtowards or retract away from the second adjustable chamber modifier wall961, or vice-versa, in order to increase or decrease the adjustablemixing chamber 970. In this way, the adjustable mixing chamber 970 canbe adjusted by the adjustable chamber modifier walls 951/961.

In some implementations, the adjustable nozzle 900 can be controlled bya controller, such as a controller 250. For example, a controller can beconfigured to control the independent movement of the first upstreamflexure 955, the first downstream flexure 956, the second upstreamflexure 965, and the second downstream flexure 966 in order to adjustthe adjustable mixing chamber 970.

For example, referring now to FIG. 10, an example controllableadjustable nozzle 900 according to additional example aspects of thepresent disclosure is depicted. FIG. 10 depicts the same adjustablenozzle 900 as FIG. 9, but includes additional details and componentsthat will be discussed in greater detail below.

For example, in some implementations, an adjustable nozzle 900 caninclude one or more electromagnets configured to generate one or moreelectromagnetic fields. In some implementations, a controller, such as acontroller 250, can be configured to control the one or moreelectromagnets to adjust the shape of the adjustable mixing chamber 970.

For example, in some implementations as shown in FIG. 10, an adjustablenozzle 900 can include a first upstream electromagnet 1010, a firstdownstream electromagnet 1011, a second upstream electromagnet 1020, anda second downstream electromagnet 1021. The electromagnets1010/1011/1020/1021 can be, for example, coiled inductors, each of whichcan generate an electromagnetic field when a current is run through thecoiled inductor. Similarly, other suitable electromagnets can be used.

In some implementations, the adjustable nozzle can include one or moremagnetically controllable fluids. For example, in some implementations,the magnetically controllable fluid can be FerroFluid. Similarly, othermagnetically controllable fluids can be used. In some implementations,the magnetically controllable fluid can be configured to react to theone or more electromagnetic fields generated by the one or moreelectromagnets to adjust the shape of the adjustable mixing chamber.

For example, in some implementations as shown in FIG. 10, the firstbypass wall 953 and the first adjustable chamber modifier wall 951 candefine a first cavity at an upstream portion (i.e. first upstreamcavity) and a first cavity at a downstream portion (i.e., firstdownstream cavity) of the first oscillation wall 950. Similarly, thesecond bypass wall 963 and the first adjustable chamber modifier wall961 can define a second cavity at an upstream portion (i.e. secondupstream cavity) and a second cavity at a downstream portion (i.e.,second downstream cavity) of the second oscillation wall 960.

In some implementations, a first upstream magnetically controllablefluid 1031 can be positioned in the first upstream cavity, a firstdownstream magnetically controllable fluid 1032 can be positioned in thefirst downstream cavity, a second upstream magnetically controllablefluid 1041 can be positioned in the second upstream cavity, and a seconddownstream magnetically controllable fluid 1042 can be positioned in thesecond downstream cavity, as depicted in FIG. 10.

In some implementations, the one or more magnetically controllablefluids can be controlled by one or more magnetic fields. For example, amagnetic field can cause the magnetically controllable fluid to alignalong the magnetic field flux lines. For example, the magneticallycontrollable fluids 1031/1032/1041/1042 positioned in their respectivecavities can react to magnetic fields generated by the electromagnets1010/1011/1020/1021. As the magnetically controllable fluids1031/1032/1041/1042 align with the respective electromagnetic fields,the magnetically controllable fluids can exert a pressure on therespective flexures 955/956/965/966 and/or chamber modifier walls951/961 to expand or contract the adjustable mixing chamber 970.

For example, in some implementations, the first upstream electromagnet1010 can be configured to generate a first upstream electromagneticfield across the first upstream magnetically controllable fluid 1031,the first downstream electromagnet 1011 can be configured to generate afirst downstream electromagnetic field across the first downstreammagnetically controllable fluid 1032, the second upstream electromagnet1020 can be configured to generate a second upstream electromagneticfield across the second upstream magnetically controllable fluid 1041,and the second downstream electromagnet 1021 can be configured togenerate a second downstream electromagnetic field across the seconddownstream magnetically controllable fluid 1042. For example, as shownin FIG. 10, each of the electromagnets 1010/1011/1020/1021 are eachpositioned generally along the tangential direction from the respectivemagnetically controllable fluids 1031/1032/1041/1042 external from theadjustable mixing chamber 970. In some implementations, each of theelectromagnets 1010/1011/1020/1021 can each be positioned outside of thefirst and second bypass tubes 954/964.

In some implementations, each of the electromagnets 1010/1011/1020/1021can be controlled to generate a respective magnetic field. For example,a current can be run through each electromagnet 1010/1011/1020/1021 togenerate a respective magnetic field. The magnetically controllablefluids 1031/1032/1041/1042 (e.g., FerroFluid) can react to therespective magnetic field by forming along the flux lines of the field.This, in turn, can cause the respective magnetically controllable fluid1031/1032/1041/1042 to expand the flexures 955/956/965/966 in therespective location. For example, the first upstream magneticallycontrollable fluid 1031 can extend or contract generally along thetangential direction, thereby creating a force on the first upstreamflexure 955, causing the upstream portion of the first adjustablechamber modifier wall 951 to extend or retract generally along thetangential direction, thereby narrowing or expanding the adjustablemixing chamber 970. Similarly, each respective magnetically controllablefluid 1031/1032/1041/1042 can react to a respective magnetic fieldgenerated by the respective electromagnet 1010/1011/1020/1021.

In some implementations, the first upstream electromagnet 1031 and thesecond upstream electromagnet 1041 can be configured to adjust a widthand orientation of the upstream throat TH₁ by generating the firstupstream electromagnetic field and the second upstream electromagneticfield, respectively. Similarly, the first downstream electromagnetic1032 and the second downstream electromagnet 1032 can be configured toadjust a width and orientation of the downstream throat TH₂ bygenerating the first downstream electromagnetic field and the seconddownstream electromagnetic field, respectively. In this way, theadjustable mixing chamber 270 can be finely controlled by controllingthe electromagnetic fields generated by each of the electromagnets1010/1011/1020/1021 in the adjustable nozzle 900.

In some implementations, the first upstream electromagnet 1010, thefirst downstream electromagnet 1011, the second upstream electromagnet1020, and the second downstream electromagnet 1021 can be configured tobe controlled by a controller, such as a controller 250, to induce thefirst upstream electromagnetic field, the second downstreamelectromagnetic field, the second upstream looked magnetic field, andthe second downstream electromagnetic field, respectively. For example,the controller 250 can be configured to control a current provided toeach of the electromagnets 1010/1011/1020/1021 independently. In thisway, the controller 250 can be configured to control the movement of theadjustable chamber modifier walls 951/961 by controlling the currentprovided to the electromagnets 1010/1011/1020/1021.

By adjusting the size and configuration of the adjustable mixing chamber970, several properties of the oscillating fluid generated by theadjustable nozzle 900 can be adjusted. For example, expanding and/orcontracting the adjustable chamber modifier walls 951/961 can adjust theoscillation frequency, the oscillation angle, and/or the direction ofthe flow of the oscillating fluid. For example, adjusting the widthand/or orientation of the first throat TH₁ and/or the width of thesecond throat TH₂ can, in some implementations, adjust the oscillationfrequency, the oscillation angle, and/or the direction of flow of theoscillating fluid. For example, the oscillation frequency can beincreased or decreased, the direction of flow can be directed from oneside of the nozzle 900 to the other, and the oscillation angle θ can bewidened or narrowed, as desired. In this way, the adjustable nozzle 900can be finely controlled, such as by a controller, to adjust the one ormore properties of the oscillating fluid generated by the adjustablenozzle 900.

The nozzles, devices, and systems of the present disclosure have beendemonstrated to provide significant advantages over commerciallyavailable nozzles. For example, Table 1 compares the example nozzlesaccording to example aspects of the present disclosure to twocommercially available nozzles. All stated values are approximate.

TABLE 1 Present Disclosure Commercial 1 Commercial 2 Oscillation Angle30° 60° 65° Oscillation Frequency 100 Hz 400-500 Hz 400-500 Hz FlowMomentum 5.98 × 10⁻⁴ kg * m/s 5.48 × 10⁻⁵ kg * m/s 2.62 × 10⁻⁵ kg * m/sFlow Velocity 51.11 mph 33.32 mph 53.14 mph Flow Rate 1.39 L/min 1.08L/min 1.58 L/min Pressure Range Greater than 4.8 bar 7.-1.4 bar .7-1.4bar Behavior Clean Oscillation Wide Spray Wide Spray

For example, one advantage provided by the nozzles according to exampleaspects of the present disclosure as compared to conventional nozzles isthat the nozzles provided herein can allow for a relatively straightflow path of fluid through the nozzles. For example, in someconventional nozzles, one or more posts may be included in an inletregion of the nozzle, which can cause a wider oscillation angle of theoscillating fluid ejected from the nozzle. Such posts, however, canimpede the flow of fluid through the nozzle, and further can reduce thesuitable pressure levels capable of generating an oscillating fluid. Forexample, two such commercially available nozzles are able to operatewithin a fluid pressure range of 0.7 bar to 1.4 bar (approximately 10-20psi) for proper operation.

The relatively straight flow paths of the nozzles according to exampleaspects of the present disclosure, however, allow for higher pressurefluids to be provided to the nozzle, such as, for example, fluids at apressure greater than 4.8 bar (approximately 70 psi). Further, higherpressure fluids can flow at higher velocities. This, in turn, can allowfor the oscillating fluids generated by the nozzles disclosed herein toachieve significantly higher momentums per droplet than oscillatingfluids generated by conventional nozzles. For example, as shown in Table1, the oscillating fluid generated by the example nozzles disclosedherein achieved a momentum per droplet (kg*m/s) that was two to tentimes higher than two commercially available nozzles.

Further, the nozzles and systems according to example aspects of thepresent disclosure can allow for oscillating fluid oscillate atapproximately 100 Hz, as compared to conventional nozzles whichtypically oscillate in the range of 400 to 500 Hz. The sloweroscillation frequency of oscillating fluid generated by nozzlesaccording to example aspects of the present disclosure can allow for theoscillating fluid to build up on a surface as the fluid contacts thesurface, which can aid in generating a wave of fluid to delaminatedebris from the surface. For example, rather than generating anoscillating spray which merely wets a surface, the nozzles according toexample aspects of the present disclosure can generate an oscillatingfluid jet which sweeps from side to side across the oscillation angle todelaminate debris from the surface.

Additionally, the nozzles and systems according to example aspects ofthe present disclosure can allow for a narrower oscillation angle thanis typically generated by conventional nozzles. For example, twocommercially available nozzles had an oscillation angle of 60° orhigher, as compared to the approximately 30° oscillation angle orvariable oscillation angles generated by nozzles according to exampleaspects the present disclosure. These narrower oscillation angles canfurther aid in delaminating debris from a surface by, for example,focusing the oscillating fluid spray to a more confined area. Thus, theoscillating fluid generated by nozzles according to example aspects thepresent disclosure can direct more oscillating fluid to a particulararea of a surface than conventional nozzles.

Additionally, the nozzles and systems according to example aspects ofthe present disclosure can allow for a reduced amount of fluid to beused to clean the surface of the sensor. For example, the increasedmomentum of the oscillating fluid as compared to conventional nozzlescan allow for a rapid delamination of debris from the surface (e.g., inless than 500 ms). This can allow for very short duration sprays to beused in order to delaminate the debris. In some implementations, thenozzles and systems according to example aspects of the presentdisclosure can use approximately 75-80% less fluid than a conventionalnozzle.

Moreover, the nozzles and systems according to example aspects of thepresent disclosure can allow for the efficient removal of debris from asensor during operation of an autonomous vehicle, thereby enablingimproved operation of the sensor. Improved performance of the sensor canlead to improved performance of the autonomous vehicle motion control,which relies upon data collected by the one or more sensors tocomprehend the surrounding environment of the autonomous vehicle. Thus,the improved nozzles and cleaning systems of the present disclosure candirectly improve autonomous vehicle performance such as efficiency,safety, and passenger comfort.

Further, in implementations in which an adjustable nozzle is used, theoscillation frequency, oscillation angle, and the direction of flow ofthe oscillating fluid can be adjusted to delaminate debris from asensor. For example, in some operating conditions, a piece of debris maybe particularly resistant to delamination from the surface, such as bugdebris deposited on the surface at a high rate of speed. By adjustingthe oscillation angle, oscillation frequency, or direction of flow ofthe oscillating fluid, a targeted and/or increased flow of fluid can beprovided to the region of the surface in which the debris is located inorder to delaminate the debris from the surface.

The technology discussed herein makes reference to servers, databases,software applications, and other computer-based systems, as well asactions taken and information sent to and from such systems. Theinherent flexibility of computer-based systems allows for a greatvariety of possible configurations, combinations, and divisions of tasksand functionality between and among components. For instance, processesdiscussed herein can be implemented using a single device or componentor multiple devices or components working in combination. Databases andapplications can be implemented on a single system or distributed acrossmultiple systems. Distributed components can operate sequentially or inparallel.

While the present subject matter has been described in detail withrespect to various specific example embodiments thereof, each example isprovided by way of explanation, not limitation of the disclosure. Thoseskilled in the art, upon attaining an understanding of the foregoing,can readily produce alterations to, variations of, and equivalents tosuch embodiments. Accordingly, the subject disclosure does not precludeinclusion of such modifications, variations and/or additions to thepresent subject matter as would be readily apparent to one of ordinaryskill in the art. For instance, features illustrated or described aspart of one embodiment can be used with another embodiment to yield astill further embodiment. Thus, it is intended that the presentdisclosure cover such alterations, variations, and equivalents.

What is claimed is:
 1. An adjustable nozzle, comprising: an inletconfigured to receive a pressurized fluid; an adjustable oscillator influid communication with the inlet, the adjustable oscillator configuredto receive the pressurized fluid from the inlet and generate anoscillating fluid, the adjustable oscillator comprising a firstoscillation wall and a second oscillation wall, the first oscillationwall comprising a first adjustable chamber modifier wall, the secondoscillation wall comprising a second adjustable chamber modifier wall,the first adjustable chamber modifier wall and the second adjustablechamber modifier wall together defining an adjustable mixing chamberconfigured to generate the oscillating fluid, the first adjustablechamber modifier wall and the second adjustable chamber modifier walladjustable so as to adjust one or more properties of the oscillatingfluid; and an outlet in fluid communication with the adjustableoscillator, the outlet configured to receive the oscillating fluid andeject the oscillating fluid from the adjustable nozzle.
 2. Theadjustable nozzle of claim 1, wherein the adjustable oscillator furthercomprises a first side wall and a second side wall; wherein the firstoscillation wall further comprises a first bypass wall, the first bypasswall and the first side wall together defining a first bypass tube; andwherein the second oscillation wall further comprises a second bypasswall, the second bypass wall and the second side wall together defininga second bypass tube.
 3. The adjustable nozzle of claim 2, wherein theadjustable oscillator defines a longitudinal direction, a tangentialdirection, an upstream direction and a downstream direction; wherein thefirst oscillation wall further comprises a first upstream flexure at anupstream portion of the first oscillation wall and a first downstreamflexure at a downstream portion of the first oscillation wall; whereinthe first adjustable chamber modifier wall is connected to the firstbypass wall via the first upstream flexure and the first downstreamflexure; wherein the second oscillation wall further comprises a secondupstream flexure at an upstream portion of the second oscillation walland a second downstream flexure at a downstream portion of the secondoscillation wall; wherein the second adjustable chamber modifier wall isconnected to the first bypass wall via the second upstream flexure andthe second downstream flexure; and wherein the first upstream flexure,the first downstream flexure, the second upstream flexure, and thesecond downstream flexure are each independently movable to adjust theadjustable mixing chamber.
 4. The adjustable nozzle of claim 3, whereinthe independent movement of the first upstream flexure, the firstdownstream flexure, the second upstream flexure, and the seconddownstream flexure are each configured to be controlled by a controllerto adjust the adjustable mixing chamber.
 5. The adjustable nozzle ofclaim 4, wherein the adjustable nozzle comprises one or moreelectromagnets configured to generate one or more electromagneticfields; and wherein the controller is configured to control the one ormore electromagnetics to adjust the shape of the adjustable mixingchamber.
 6. The adjustable nozzle of claim 5, wherein the adjustablenozzle comprises one or more magnetically controllable fluids; whereinthe one or more magnetically controllable fluids are configured to reactto the one or more electromagnetic fields generated by the one or moreelectromagnetics to adjust the shape of the adjustable mixing chamber.7. The adjustable nozzle of claim 6, wherein the first bypass wall andthe first chamber modifier wall together define a first upstream cavityat the upstream portion of the first oscillation wall and a firstdownstream cavity at the downstream portion of the first oscillationwall; wherein second bypass wall and the second chamber modifier walltogether define a second upstream cavity at the upstream portion of thesecond oscillation wall and a second downstream cavity at the downstreamportion of the second oscillation wall; and wherein the one or more oneor more magnetically controllable fluids comprise a first upstreammagnetically controllable fluid positioned in the first upstream cavity,a first downstream magnetically controllable fluid positioned in thefirst downstream cavity, a second upstream magnetically controllablefluid positioned in the second upstream cavity, and a second downstreammagnetically controllable fluid positioned in the second downstreamcavity.
 8. The adjustable nozzle of claim 7, wherein the one or moreelectromagnets comprise a first upstream electromagnet configured togenerate a first upstream electromagnetic field across the firstupstream magnetically controllable fluid, a first downstreamelectromagnet configured to generate a first downstream electromagneticfield across the first downstream magnetically controllable fluid, asecond upstream electromagnet configured to generate a second upstreamelectromagnetic field across the second upstream magneticallycontrollable fluid, and a second downstream electromagnet configured togenerate a second downstream electromagnetic field across the seconddownstream magnetically controllable fluid.
 9. The adjustable nozzle ofclaim 8, wherein the first chamber modifier wall and the second chambermodifier wall together define an upstream throat along the tangentialdirection at an upstream portion of the adjustable mixing chamber and adownstream throat along the tangential direction at a downstream portionof the adjustable mixing chamber; and wherein the first upstreamelectromagnet and the second upstream electromagnet are configured toadjust a width and orientation of the upstream throat by generating thefirst upstream electromagnetic field and the second upstreamelectromagnetic field, respectively; and wherein the first downstreamelectromagnet and the second downstream electromagnet are configured toadjust a width and orientation of the downstream throat by generatingthe first downstream electromagnetic field and the second downstreamelectromagnetic field, respectively.
 10. The adjustable nozzle of claim1, wherein the one or more properties of the oscillating fluid compriseat least one of an oscillation frequency, an oscillation angle, and adirection of a flow of the oscillating fluid.
 11. The adjustable nozzleof claim 1, wherein the pressurized fluid comprises a fluid at apressure greater than 4.8 bar.
 12. The adjustable nozzle of claim 1,wherein the adjustable nozzle is configured to eject the oscillatingfluid onto a surface of a sensor of an autonomous vehicle to delaminatedebris from the surface.
 13. A cleaning system, comprising: a source ofpressurized fluid; and an adjustable nozzle, comprising: an inletconfigured to receive the pressurized fluid; an adjustable oscillator influid communication with the inlet, the adjustable oscillator configuredto receive the pressurized fluid from the inlet and generate anoscillating fluid, the oscillator comprising a first oscillation walland a second oscillation wall, the first oscillation wall comprising afirst adjustable chamber modifier wall, the second oscillation wallcomprising a second adjustable chamber modifier wall, the firstadjustable chamber modifier wall and the second adjustable chambermodifier wall together defining an adjustable mixing chamber configuredto generate the oscillating fluid, the first adjustable chamber modifierwall and the second adjustable chamber modifier wall configured toadjust one or more properties of the oscillating fluid; and an outlet influid communication with the oscillator, the outlet configured toreceive the oscillating fluid and eject the oscillating fluid from theadjustable nozzle.
 14. The cleaning system of claim 13, furthercomprising: a controller configured to control the first adjustablechamber modifier wall and the second adjustable chamber modifier wall toadjust the one or more properties of the oscillating fluid.
 15. Thecleaning system of claim 14, wherein the one or more properties compriseat least one of an oscillation frequency, an oscillation angle, and adirection of a flow of the oscillating fluid.
 16. The cleaning system ofclaim 14, wherein the adjustable oscillator further comprises a firstside wall and a second side wall; wherein the first oscillation wallfurther comprises a first bypass wall, a first upstream flexure at anupstream portion of the first oscillation wall, and a first downstreamflexure at a downstream portion of the first oscillation wall, the firstbypass wall and the first side wall together defining a first bypasstube; wherein the first adjustable chamber modifier wall is connected tothe first bypass wall via the first upstream flexure and the firstdownstream flexure; wherein the second oscillation wall furthercomprises a second bypass wall, a second upstream flexure at an upstreamportion of the second oscillation wall, and a second downstream flexureat a downstream portion of the second oscillation wall, the secondbypass wall and the second side wall together defining a second bypasstube; wherein the second adjustable chamber modifier wall is connectedto the first bypass wall via the second upstream flexure and the seconddownstream flexure; wherein the first upstream flexure, the firstdownstream flexure, the second upstream flexure, and the seconddownstream flexure are each independently movable to adjust theadjustable mixing chamber; and wherein the controller is configured tocontrol the independent movement of the first upstream flexure, thefirst downstream flexure, the second upstream flexure, and the seconddownstream flexure to adjust the adjustable mixing chamber.
 17. Thecleaning system of claim 16, wherein the adjustable nozzle comprises oneor more electromagnets configured to generate one or moreelectromagnetic fields; and wherein the controller is configured tocontrol the one or more electromagnetics to adjust the shape of theadjustable mixing chamber.
 18. The cleaning system of claim 17, whereinthe adjustable nozzle comprises one or more magnetically controllablefluids; wherein the one or more magnetically controllable fluids areconfigured to react to the one or more electromagnetic fields generatedby the one or more electromagnetics to adjust the shape of theadjustable mixing chamber.
 19. The cleaning system of claim 18, whereinthe first bypass wall and the first chamber modifier wall togetherdefine a first upstream cavity at the upstream portion of the firstoscillation wall and a first downstream cavity at the downstream portionof the first oscillation wall; wherein second bypass wall and the secondchamber modifier wall together define a second upstream cavity at theupstream portion of the second oscillation wall and a second downstreamcavity at the downstream portion of the second oscillation wall; whereinthe one or more one or more magnetically controllable fluids comprise afirst upstream magnetically controllable fluid positioned in the firstupstream cavity, a first downstream magnetically controllable fluidpositioned in the first downstream cavity, a second upstreammagnetically controllable fluid positioned in the second upstreamcavity, and a second downstream magnetically controllable fluidpositioned in the second downstream cavity; and wherein the one or moreelectromagnets comprise a first upstream electromagnet configured togenerate a first upstream electromagnetic field across the firstupstream magnetically controllable fluid, a first downstreamelectromagnet configured to generate a first downstream electromagneticfield across the first downstream magnetically controllable fluid, asecond upstream electromagnet configured to generate a second upstreamelectromagnetic field across the second upstream magneticallycontrollable fluid, and a second downstream electromagnet configured togenerate a second downstream electromagnetic field across the seconddownstream magnetically controllable fluid.
 20. An autonomous vehicle,comprising: a sensor comprising a surface; and a cleaning system,comprising: a source of high pressure fluid; a controller; and anadjustable nozzle, comprising: an inlet configured to receive thepressurized fluid; an adjustable oscillator in fluid communication withthe inlet, the adjustable oscillator configured to receive thepressurized fluid from the inlet and generate an oscillating fluid, theoscillator comprising a first oscillation wall and a second oscillationwall, the first oscillation wall comprising a first adjustable chambermodifier wall, the second oscillation wall comprising a secondadjustable chamber modifier wall, the first adjustable chamber modifierwall and the second adjustable chamber modifier wall together definingan adjustable mixing chamber configured to generate the oscillatingfluid, the first adjustable chamber modifier wall and the secondadjustable chamber modifier wall configured to adjust one or moreproperties of the oscillating fluid; and an outlet in fluidcommunication with the oscillator, the outlet configured to receive theoscillating fluid and eject the oscillating fluid from the adjustablenozzle. wherein the one or more properties comprise one or more of anoscillation frequency, an oscillation angle, and a direction of a flowof the oscillating fluid; and wherein the controller is configured tocontrol the adjustable nozzle to eject the oscillating fluid onto thesurface to delaminate debris from the surface.